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1. 原著論文    2. 国際会議発表    3. 解説論文、総合報告、著書 等

1. 原著論文

  • ［1］Hisamichi Yoshigoe, Shotaro Kadoya, Satoru Takahashi, and Kiyoshi Takamasu: Fabrication and Composition Control of Three-Dimensional Dielectric Metal Microstructure Using Photocatalyst Nanoparticles, International Journal of Automation Technology, 8, 4, (2014) pp. 523-529.
  • ［2］S. Takahashi, H. Yokozeki, D. Fujii, R. Kudo, K. Takamasu: A novel dark field in-process optical inspection method for micro-openings on mirrored surfaces beyond the diffraction limit using active phase control, CIRP Annals - Manufacturing Technology Vol. 63/1, 2014, 465-468.
  • ［3］Hiroki Yokozeki, Ryota Kudo, Satoru Takahashi, Kiyoshi Takamasu: Lateral resolution improvement of laser-scanning imaging for nano defects detection, Advanced Optical Technologies, ISSN (Online) 2192-8584 (2014).
  • ［4］Muzheng Xiao, Tomohiko Takamura, Satoru Takahashi, Kiyoshi Takamasu: Random error analysis of profile measurement of large aspheric optical surface using scanning deflectometry with rotation stage Original Research Article, Precision Engineering 37, No.3 (2013)599-605.
  • ［5］Xiaonan Wang, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: Spatial positioning measurements up to 150 m using temporal coherence of optical frequency comb Original Research Article, Precision Engineering 37, No.3 (2013)635-639.
  • ［6］S. Takahashi, Y. Ikeda, K. Takamasu: Study on nano thickness inspection for residual layer of nanoimprint lithography using near-field optical enhancement of metal tip, CIRP Annals - Manufacturing Technology Vol. 62/1, 2013, 527-530.
  • ［8］Kenta Matsui, Hirokazu Matsumoto, Satoru Takahashi, Kiyoshi Takamasu: New Non-contact Measurement of Small Inside-diameter Using Tandem Low-coherence Interferometer and Optical Fiber Devices, Key Engineering Materials Vols. 523-524 (2012) pp 871-876.
  • ［9］Taro Onoe, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: Development of a non-contact precision measurement technique using optical frequency combs, Key Engineering Materials Vols. 523-524 (2012) pp 877-882.
  • ［10］Haruki Okito, Satoru Takahashi, Kiyoshi Takamasu: Sub-Nanometer Line Width and Line Profile Measurement Using STEM Images with Metal Coating, Key Engineering Materials Vols. 523-524 (2012) pp 957-960.
  • ［11］T．Kurihara，R．Sugimoto，R．Kudo，S．Takahashi，K．Takamasu： Height Measurement of Single Nano Particle Based on Evanescent Field Modulation，International Journal of Nanomanufacturing, 8(5/6), 2012, 419-431.
  • ［12］S. Takahashi, Y. Kajihara, K. Takamasu: Submicrometer thickness layer fabrication for layer-by-layer microstereolithography using evanescent light, CIRP Annals - Manufacturing Technology Vol. 61/1, 2012, 219-222.
  • ［13］A. Winarno, S. Takahashi, A. Hirai, K. Takamasu and H. Matsumoto: Absolute measurement of gauge block without wringing using tandem low-coherence interferometry, Meas. Sci. Technol. 23 125001.
  • ［14］工藤良太，高橋哲，高増潔：半導体ベアウエハ表面ナノ欠陥の超解像光学式計測に関する研究，砥粒加工学会誌 Vol.56 No.2, (2012),OCT. pp709-710.
  • ［15］R．Kudo，S．Usuki ，S．Takahashi，K．Takamasu： Influence of standing wave phase error on super-resolution optical inspection for periodic microstructures，Measurement Science and Technology 23，5(2012)，054007，(13pp).
  • ［16］Narin Chanthawong, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: A new method for high-accuracy gauge block measurement using 2 GHz repetition mode of a mode-locked fiber laser, Measurement Science and Technology, 23, 054003, 2012, 1-6.
  • ［17］Muzheng Xiao, Satomi Jujo, Satoru Takahashi, Kiyoshi Takamasu: Nanometer profile measurement of large aspheric optical surface by scanning deflectometry with rotatable devices: Uncertainty propagation analysis and experiments, Precision Engineering Vol. 36, No. 1, 2012, 91-96.
  • ［18］Xiaonan Wang, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: Space position measurement using long-path heterodyne interferometer with optical frequency comb, Optics Express Vol. 20, No. 2, 2012, 2725-2732.
  • ［19］Ping Yang, Tomohiko Takamura, Satoru Takahashi, Kiyoshi Takamasu, Osamu Sato, Sonko Osawa, Toshiyuki Takatsuji: Multi-probe scanning system comprising three laser interferometers and one autocollimator for measuring flat bar mirror profile with nanometer accuracy, Precision Engineering Vol. 35, No. 3,2011, 686-692.
  • ［20］S. Takahashi, R. Kudo, S. Usuki, K. Takamasu: Super resolution optical measurements of nanodefects on Si wafer surface using infrared standing evanescent wave, CIRP Annals - Manufacturing Technology Vol. 60/1, 2011, 523-526.
  • ［21］Ping Yang, Tomohiko Takamura, Satoru Takahashi, Kiyoshi Takamasu, Osamu Sato, Sonko Osawa, Toshiyuki Takatsuji: Development of high-precision micro-coordinate measuring machine: Multi-probe measurement system for measuring yaw and straightness motion error of XY linear stage, Precision Engineering Vol. 35, No. 2, 2011, 424-430.
  • ［22］Dong Wei, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: Time-of-flight method using multiple pulse train interference as a time recorder, Optics Express, Vol. 19, No. 6, 2011, 4881-4889.
  • ［23］Dong Wei, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: Theoretical Analysis of Length Measurement Using Interference of Multiple Pulse Trains of a Femtosecond Optical Frequency Comb, Japanese Journal of Applied Physics 50(2), 2011, 022701-1-5.
  • ［24］Ryota Kudo, Shin Usuki, Satoru Takahashi, Kiyoshi Takamasu: Simulation-Based Analysis of Influence of Error on Super-Resolution Optical Inspection, Int. J. of Automation Technology Vol. 5, No. 2, 2011, 167-172.
  • ［25］Keisuke Matsuda, Satoru Takahashi, Kiyoshi Takamasu: Development of In-process Visualization System for Laser-assisted Three-dimensional Microfabrication using Photocatalyst Nanoparticles, International Journal of Precision Engineering and Manufacturing, Vol. 11, No. 6, 2010, 811-815.
  • ［26］Kiyoshi Takamasu, Satoru Takahashi, Xin Chen: Uncertainty Estimation in Intelligent Coordinate and Profile Measurement, Key Engineering Materials, Vols. 447-448, 2010, 564-568.
  • ［27］Ping Yang, Shusaku Shibata, Satoru Takahashi, Kiyoshi Takamasu, Osamu Sato, Sonko Osawa, Toshiyuki Takatsuji: A Multi-probe Measurement Method to Evaluate the Yaw and Straightness Errors of XY Stage on High Precision CMM, Key Engineering Materials, Vols. 447-448, 2010, 590-594.
  • ［28］Muzheng Xiao, Satomi Jujo, Satoru Takahashi, Kiyoshi Takamasu: Profile Measurement of Large Aspheric Optical Surface by Scanning Deflectometry with Rotatable Optical Devices - Error Analysis and Pre-experiment -, Key Engineering Materials, Vols. 447-448, 2010, 604-608.
  • ［29］S. Takahashi, K. Watanabe, K. Takamasu：A novel resist surface profilometers for next-generation photolithography using mechano-optical arrayed probe system, Annals of CIRP 59/1(2010)521-524.
  • ［30］D. Wei, S. Takahashi, K. Takamasu, and H. Matsumoto：Simultaneous Observation of High Temporal Coherence between Two Pairs of Pulse Trains Using a Femtosecond-Optical-Frequency-Comb-Based Interferometer, Japanese journal of applied physics 48(2009)070211
  • ［31］D. Wei, S. Takahashi, K. Takamasu, and H. Matsumoto：Femtosecond optical frequency comb-based tandem interferometer, Journal of the European Optical Society -Rapid publications 4(2009), 09043
  • ［32］S. Takahashi, S. Minamiguchi, T. Nakao, S. Usuki, K. Takamasu：Study on residual layer thickness measurement for Nanoimprint Lithography based on near-field optics, Int. J. Surface science and Engineering, 3(3)(2009)178-194
  • ［33］D. Wei, S. Takahashi, K. Takamasu, and H. Matsumoto：Experimental observation of pulse trains' destructive interference with a femtosecond optical frequency-comb-based interferometer, Opt. Lett. 34(2009)2775-2777
  • ［34］Shujie Liu, KentaroWatanabe, Xin Chen, Satoru Takahashi, Kiyoshi Takamasu：Profile measurement of a wide-area resist surface using a multi-ball cantilever system，Precision Engineering 33 (2009) 50–55
  • ［35］Shin Usuki, Hiroaki Nishioka, Satoru Takahashi, Kiyoshi Takamasu：Experimental verification of super-resolution optical inspection for semiconductor defects by using standing wave illumination shift，International Journal of Advanced Manufacturing Technology, 46(2009)（DOI:10.1007/s00170-008-1901-y）863-875
  • ［36］D. Wei, S. Takahashi, K. Takamasu, and H. Matsumoto：Analysis of the temporal coherence function of a femtosecond optical frequency comb, Opt. Express 17(2009), 7011-7018
  • ［37］S. Takahashi, S. Okada, H. Nishioka, S. Usuki, K. Takamasu：Theoretical and numerical analysis of lateral resolution improvement characteristics for fluorescence microscopy using standing evanescent light with image，Meas. Sci. Technol., 19 (8)(2008) 084006
  • ［38］K. Takamasu, S. Takahashi, M. Abbe, R. Furutani：Uncertainty estimation for coordinate metrology with effects of calibration and form deviation in strategy of measurement，Meas. Sci. Technol. 19 (8)(2008)084001
  • ［39］臼杵深，西岡宏晃，高橋哲，高増潔：変調照明シフトによる超精密加工表面の超解像光学式欠陥計測に関する研究(第2報)－定在波照明シフト実験による解像原理の実験的検証－，精密工学会誌，74 (6) (2008)581-586
  • ［40］Yusuke Kajihara, Toru Takeuchi, Satoru Takahashi, Kiyoshi Takamasu：Development of an In-process Confocal Positioning System for Nanostereolithography Using Evanescent Light，International Journal of Precision Engineering and Manufacturing, 9 (3)(2008) 51-54
  • ［41］S. Liu, K. Watanabe, S. Takahashi, K. Takamasu：Intelligent Profile Measurement for Wide-Area Resist Surface Using Multi-Sensor AFM System，Key Engineering Materials Vols. 381-382(2008)407-410
  • ［42］臼杵深，西岡宏晃，高橋哲，高増潔：変調照明シフトによる超精密加工表面の超解像光学式欠陥計測に関する研究(第1報)－解像特性の理論的検討－，精密工学会誌，74 (5)(2008)498-503
  • ［43］Y. Kajihara, Y. Inazuki, T. Takeuchi, S. Takahashi, K. Takamasu：Evanescent light photopolymerization and measurement of cure depth in nanostereolithography，Applied Physics Letters 92 (2008)093120
  • ［44］梶原優介，稲月友一，高橋哲，高増潔：エバネッセント光を利用したナノ光造形法に関する研究(第2報)－定在エバネッセント光を利用した微細周期構造創製－，精密工学会誌，73(8)(2007)934-939
  • ［45］Shujie Liu, Shuichi Nagasawa, Satoru Takahashi, Kiyoshi Takamasu：Development of a Multi-Ball-Cantilever AFM for Measuring Resist Surface，Journal of Robotics and Mechatronics, Vol. 18, No. 6(2006)698-704
  • ［46］梶原優介，稲月友一，高橋哲，高増潔：エバネッセント光を利用したナノ光造形法に関する研究(第1報)－造形基本特性の理論的・実験的検討－，精密工学会誌，72,11(2006)1391-1396
  • ［47］吉岡淑江，三好隆志，高谷裕浩，高橋哲：輪帯エバネッセント照明による回路パターン付きSiウエハの表面異物欠陥検出法に関する研究(第1報)－欠陥検出原理とその検証実験－，精密工学会誌，72,7(2006)878-883
  • ［48］臼杵深，侯冰，清澤圭太朗，江並和宏，平木雅彦，高橋哲，高増潔，大園成夫：リングビームを用いた三次元変位測定法(第2報)－リングイメージの楕円近似による非線形性の改善－，精密工学会誌，72,1(2006)132-136
  • ［49］S. Usuki, K. Enami, M. Hiraki, S. Takahashi, K. Takamasu：Theoretical Analysis and Basic Experiments for the 3D Displacement Measurement Using Ring-Shaped Laser Beam，Key Engineering Materials Vols. 295-296(2005)295-300
  • ［50］S. Takahashi, R. Nakajima, T. Miyoshi, Yasuhiro Takaya, K. Takamasu：Development of an Evanescent Light Measurement System for Si Wafer Microdefect Detection，Key Engineering Materials Vols. 295-296(2005)15-20
  • ［51］T. Ha, T. Miyoshi, Y. Takaya, S. Takahashi：Laser Scattering Measurment of Microdefects on Silicon Oxide Wafer，Key Engineering Materials Vols. 295-296(2005)3-8
  • ［52］A. Taguchi, T. Miyoshi, Y. Takaya, S. Takahashi：Optical 3D profilometer for in-process measurement of microsurface based on phase retrieval technique，Precision Engineering，28，2(2004)152-163
  • ［53］江並和宏，臼杵深，平木雅彦，高橋哲，高増潔，大園成夫: リングビームを用いた三次元変位測定法(第1報)－理論解析と基礎実験－, 精密工学会誌，69，12(2003)1764-1768
  • ［54］西野秀昭，三好隆志，高谷裕浩，高橋哲，林照剛，木村景一: 液晶マスクを用いた非積層マイクロ光造形法に関する研究(第2報)－液晶動画像を用いた薄層型積層造形, 精密工学会誌，69，10(2003)1417-1422
  • ［55］中島隆介，高橋哲，三好隆志，高谷裕浩:赤外エバネッセント光によるシリコンウエハ加工表面層欠陥検出に関する研究(第1報)－理論的・実験的検討－, 精密工学会誌，69，9(2003)1291-1295
  • ［56］Taeho Ha, Takashi Miyoshi, Yasuhiro Takaya, Satoru Takahashi：Size determination of microscratches on silicon oxide wafer surface using scattered light，Precision Engineering，27, 3 (2003) 265-272
  • ［57］木村景一，三好隆志，高谷裕浩，高橋哲：光放射圧制御微粒子集積現象に基づくCMP加工に関する基礎的研究，精密工学会誌，69，1(2003)89-94
  • ［58］S. Lee, T. Miyoshi, Y. Takaya, S. Takahashi：Non-contact 3D edge profile measurement for die and mold model surface, Journal of Material Processing technology, 127 (2002) 286-291
  • ［59］高橋 哲，三好隆志，高谷裕浩，立野泰史：光散乱パターンを用いたシリコンウエハ加工表面欠陥のインプロセス計測に関する研究（第２報）−高速欠陥計測法の提案−， 精密工学会誌，68，7（2002）962-966
  • ［60］Takashi MIYOSHI, Satoru TAKAHASHI, Yasuhiro TAKAYA, and Shoichi SHIMADA：High Sensitivity Optical Detection of Oriented Micro defects on Silicon Wafer Surfaces Using Annular Illumination, 2001 CIRP GENERAL ASSEMBLY, CIRP ANNALS, 50, 1（2001）389-392
  • ［61］Seojoon LEE，三好隆志，高谷裕浩，高橋 哲：自由曲面形状の３次元エッジプロファイル計測に関する研究（第１報）−光リング画像によるエッジ自動検出−，精密工学会誌，67，6（2001）997-1002
  • ［62］林 照剛，三好隆志，高谷裕浩，高橋 哲：液晶マスクを用いた非積層マイクロ光造形法に関する研究（第１報）−濃淡画像による非積層造形−，精密工学会誌，67，4（2001）628-632
  • ［63］Jian BAI, Yasuhiro TAKAYA, Takashi MIYOSHI, and Satoru TAKAHASHI：Dynamic Analysis of Laser Trapping on Arbitrary Shaped Particles as Micro-machining Tools, Journal of the Japan Society for Precision Engineering, 66, 11（2000）1729-1734
  • ［64］Atsushi TAGUCHI, Takashi MIYOSHI, Yasuhiro TAKAYA, Satoru TAKAHASHI, and Katsumasa SAITO：3D Micro-Profile Measurement using Optical Inverse Scattering Phase Method, 2000 CIRP GENERAL ASSEMBLY, CIRP ANNALS, 49, 1（2000）423-426
  • ［65］高谷裕浩，佐藤憲章，高橋 哲，三好隆志，清水浩貴，渡辺万次郎：ナノCMMレーザトラッピングプローブに関する研究（第１報）−３次元位置検出の基本原理−，精密工学会誌，66，7（2000）1081-1086
  • ［66］清水浩貴，三好隆志， 高谷裕浩， 高橋 哲：光放射圧を利用した微粒子操作によるマイクロ加工に関する基礎的研究，精密工学会誌，66，6（2000）901-906
  • ［67］Jian BAI, Takashi MIYOSHI, Yasuhiro TAKAYA, and Satoru TAKAHASHI：Computer Simulation for Laser Trapping on Micro-particles with Arbitrary Shape, International Journal of the Japan Society for Precision Engineering, 33, 4（1999）363-368
  • ［68］聶 朝胤，三好隆志，高谷裕浩，高橋 哲，梁田和雄：金型加工曲面の光リング式3D形状計測センサの開発（第１報）−金属面の光散乱シミュレーションとその検証−，精密工学会誌，65，11（1999）1668-1673
  • ［69］後藤孝行，高谷裕浩，高橋 哲，三好隆志：高密度測定点データに基づく自由曲面生成法に関する研究（第２報）−擬頂点を用いた曲線曲面・曲面の接続法−，精密工学会誌，65，10（1999）1430-1434
  • ［70］高橋 哲，三好隆志，高谷裕浩，立野泰史，平田文彦，剱持妥茂哉：光散乱パターンを用いたシリコンウェハ加工表面欠陥のインプロセス計測に関する研究（第１報）−微小付着異物の光散乱パターン特性解析−，精密工学会誌，65，9（1999）1284-1289
  • ［71］Yasuhiro TAKAYA, Satoru TAKAHASHI, Takashi MIYOSHI and Katsumasa SAITO：Development of The Nano-CMM Probe based on Laser Trapping Technology, 1999 CIRP GENERAL ASSEMBLY, CIRP ANNALS, 48, 1（1999）421-424
  • ［72］Yasuhiro TAKAYA, Hiroki SHIMIZU, Satoru TAKAHASHI, and Takashi MIYOSHI：Fundamental Study on The New Probe Technique for The Nano-CMM based on The Laser Trapping and Mirau Interferometer, Measurement, 25, 1（1999）9-18
  • ［73］Satoru TAKAHASHI, Takashi MIYOSHI, Yasuhiro TAKAYA, and Katsumasa SAITO：In-process Measurement Method for Detection and Discrimination of Silicon Wafer Surface Defects by Laser Scattered Defect Pattern, 1998 CIRP GENERAL ASSEMBLY, CIRP ANNALS, 47, 1（1998）459-462
  • ［74］平田文彦，立野泰史，高橋 哲，高谷裕浩，三好隆志：レーザ光検出パターンによるシリコンウェハ加工表面の欠陥識別，砥粒加工学会誌，42，2（1998）85-86
  • ［75］枝光毅彦，高谷裕浩，三好隆志，後藤孝行，高橋 哲：高密度計測点群のＢ−スプライン曲面へのあてはめに関する研究−曲率を考慮したノット位置およびパラメータ設定法−，精密工学会誌，62，10（1996）1425-1429
  • ［76］三好隆志，高谷裕浩，木下浩一，高橋 哲，永田貴之：光逆散乱位相法による微細加工形状計測に関する研究−周期微細溝形状の位相回復−，精密工学会誌，62，7（1996） 958-963/li>

2. 国際会議発表

  • ［1］S. Takahashi, H. Tahara, K. Miyakawa, Y. Kajihara, and K. Takamasu: Fundamental study on the world’s thinnest layered micro-stereolithography using evanescent light, Proc. of ASPE2014 Spring Topical Meeting, 163-166.
  • ［2］Kiyoshi Takamasu, Haruki Okitou, Satoru Takahashi, Mitsuru Konno, Osamu Inoue, Hiroki Kawada: Roughness and Line Profile Measurement of Photoresist and FinFET Features by Cross-Section STEM Image for Reference Metrology, SPIE Advanced Lithography 2014, San Jose, USA.
  • ［3］Taro Onoe, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: Non-contact precision distance measurement technique using two optical frequency combs, 5th International Conference of Asian Society for Precision Engineering and Nanotechnology, (2013), Taipei.
  • ［4］Narin Chanthawong, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: High-accuracy calibration of CMM using temporal-coherence fiber interferometer with fast-repetition comb laser, 5th International Conference of Asian Society for Precision Engineering and Nanotechnology, (2013), Taipei.
  • ［5］Yuki Yamaguchi, Takahiro Sekino, Satoru Takahashi, Kiyoshi Takamasu: Study on Photocatalyzed Nano-removal Processing Tool for Microstereolithography, 5th International Conference of Asian Society for Precision Engineering and Nanotechnology, (2013), Taipei.
  • ［6］Ryota Kudo, Hiroki Yokozeki, Satoru Takahashi, Kiyoshi Takamasu: Coherent Imaging Algorithm of Super-Resolution Optical Inspection with Structured Light Shift, Proc. of The 7th International Conference on Leading Edge Manufacturing in 21st Century, (2013), 177-181.
  • ［7］K. Miyakawa, R. Matsuzawa, S. Takahashi, K. Takamasu: Development of Hybrid Nano-Stereolithography System Using Evanescent Light and Propagating Light for High Throughput Fabrication, , Proc. ASPE2013, St. Paul, USA, 2013, 20-23.
  • ［8］Hiroki Yokozeki, Ryota Kudo, Satoru Takahashi, Kiyoshi Takamasu: Study on Lateral Resolution Improvement of Laser-Scanning Imaging for Nano Defects Inspection, The 11th International Symposium of Measurement Technology and Intelligent Instruments,(2013), Aachen.
  • ［9］Kyohei Ishikawa, Tomohiko Takamura, Muzheng Xiao, Satoru Takahashi, Kiyoshi Takamasu: Nanometer Profile Measurement on Large Aspheric Optical Surface by Scanning Deflectometry with Rotatable Autocollimator -Error Analysis and Measurement Experiments by Using Autocollimator with Wide Measuring Range-, The 11th International Symposium of Measurement Technology and Intelligent Instruments,(2013), Aachen.
  • ［10］H. Yoshigoe, S. Takahashi, K. Takamasu: Experimental Analysis of Laser-Assisted Microfabrication Using TiO2 Nanoparticles, Proceedings of the 13th euspen International Conference, (2013)80-83.
  • ［11］S. Takahashi, J. Li, P. Herman: Laser erasing of ultrafast lase written optical waveguides in fused silica glass, Photonic West, Ultrafast Laser Volume Structuring III, San Francisco, 2013.2.4.
  • ［12］C. Narin, S. Takahashi, K. Takamasu, H. Matsumoto : STEP GAUGE MEASUREMENT USING HIGH-FREQUENCY REPETITIONS OF A MODE-LOCKED FIBER LASER, XX IMEKO World Congress, TC14-O19, 2012
  • ［13］K. Takamasu, S. Takahashi, R. Furutani, M. Abbe: ROUND ROBIN TESTS OF UNCERTAINTY ESTIMATION FOR COORDINATE METROLOGY BY SOFTWARE ERROR PROPAGATION, XX IMEKO World Congress, TC14-O15, 2012.
  • ［14］R. Kudo, S. Takahashi, K. Takamasu : DESIGN VALUE USE TYPE SUPER-RESOLUTION OPTICAL INSPECTION FOR MICROFABRICATED STRUCTURE DEFECTS BY USING STANDING WAVE ILLUMINATION SHIFT, XX IMEKO World Congress, TC14-O8, 2012.
  • ［15］Muzheng Xiao, Tomohiko Takamura, Satoru Takahashi, Kiyoshi Takamasu : NANOMETER PROFILE MEASUREMENT OF LARGE ASPHERIC OPTICAL SURFACE WITH IMPROVED DEFLECTOMETRY METHOD - PRINCIPLE INTRODUCTION AND EXPERIMENTAL VERIFICATION -, XX IMEKO World Congress, SS2-O3, 2012.
  • ［16］S. Takahashi: Super-Resolution Visual Inspection for Microstructures Manufacturing, The 3rd International Conference on Digital Manufacturing & Automation (ICDMA2012).
  • ［17］Muzheng Xiao, Satomi Jujo, Satoru Takahashi, Kiyoshi Takamasu: Nanometer Profile Measurement of Large Aspheric Optical Surface by Scanning Deflectometry with Rotation Devices -Development Of Three Dimensional Measuring Facility and Experiment -, Proc. of the euspen International Conference, Stockholm, Sweden, euspen2012, 2012, 137-140.
  • ［18］Xiaonan Wang, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: Super-heterodyne Interferomter for LengthMeasurment Using the Beat Signal of Laser Diodes and the Optical Frequency Comb, Proc. of the euspen International Conference, Stockholm, Sweden, euspen2012, 2012, 259-262.
  • ［19］Kiyoshi Takamasu, Haruki Okitou, Satoru Takahashi, Mitsuru Konno, Osamu Inoue, Hiroki Kawada: Sub-nanometer calibration of line width measurement and line edge detection by using STEM and sectional SEM, Proc. SPIE Advanced Lithography 2012, San Jose, USA, 2012, 83240X 1-7.
  • ［20］S. Takahashi : Micro 3-D Fabrication and Nano Scale Metrologyby Controlling Localized Light Energy, 4th TU-SNU-UT Joint Symposium, -Design and Manufacturing I-, 2012.3.12.
  • ［21］Xiaonan Wang, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: Absolute Distance Measurement Using Long-Path Heterodyne Interferometer with Optical Frequency Comb, Proc. FIO/LS, OSA, San Jose, USA, 2011, FThH3, 1-2.
  • ［22］Ping Yang, Tomohiko Takamura, Satoru Takahashi, Kiyoshi Takamasu, Osamu Sato, Sonko Osawa, Toshiyuki Takatsuji: Multi-probe system comprising three laser interferometers and one autocollimator for measuring flat bar mirror profile with nanometer accuracy on a high-precision micro-coordinate measuring machine, Proc. SPIE Optics + Photonics, 2011, San Diego, USA, 81330T 1-7.
  • ［23］Muzheng Xiao, Satomi Jujo, Satoru Takahashi, Kiyoshi Takamasu: Nanometer Profile Measurement of Large Aspheric Optical Surface by Scanning Deflectometry with Rotatable Devices, Proc. SPIE Optics + Photonics, San Diego, USA, 2011, 81260R 1-7.
  • ［24］Muzheng Xiao, Satomi Jujo, Kiyoshi Takamasu, Satoru Takahashi: Nanometer Profile Measurement of Large Aspheric Optical Surface by Scanning Deflectometry with Rotatable Devices - Error Analysis and Experiments -, Proc. euspen2011, Como, Italy, 2011, 129-132.
  • ［25］P. Yang, T. Takamura, S. Takahashi, K. Takamasu, O. Sato, S. Osawa, T. Takatsuji: A motion errors and profile measurement system using three laser interferometers and one autocollimator for a high-precision micro-coordinate measuring machine, Proc. euspen2011, Como, Italy, 2011, 150-153.
  • ［26］Xiaonan Wang, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: Experimental evaluation of long path heterodyne interferometers with optical-frequency comb and continuous-wave laser, Proc. ISMTII2011, Daejeon, Korea, 2011, A4-3, 1-5
  • ［27］Ryota Kudo, Shin Usuki, Satoru Takahashi, Kiyoshi Takamasu: Experimental analysis of influence of error on super-resolution optical inspection using standing wave illumination, Proc. ISMTII2011, Daejeon, Korea, 2011, A5-4, 1-6
  • ［28］Guoqing Ding, Xin Chen, Satoru Takahashi, Kiyoshi Takamasu: On-machine profile measurement by multiple sensors scanning method with two kinds of algorithms, Proc. ISMTII2011, Daejeon, Korea, 2011, A7-2, 1-6
  • ［29］Narin Chanthawong, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: High accuracy gauge block measurement using 2-GHz repetitions mode of a mode-locked fiber laser, Proc. ISMTII2011, Daejeon, Korea, 2011, B4-1, 1-4
  • ［30］Tomohiko Takamura, Ping Yang, Satoru Takahashi, Kiyoshi Takamasu, Osamu Sato, Sonko Osawa, Toshiyuki Takatsuji: Development of high precision Coordinate Measuring Machine - Uncertainty analysis of multi-probe method, Proc. ISMTII2011, Daejeon, Korea, 2011, D2-5, 1-6
  • ［31］Xin Chen, Guoqing Ding, Satoru Takahashi, Kiyoshi Takamasu: Self-calibration for two-dimensional stage using least squares solution, Proc. ISMTII2011, Daejeon, Korea, 2011, E3-1, 1-6
    • ［32］Ping Yang, Tomohiko Takamura, Satoru Takahashi, Kiyoshi Takamasu, Osamu Sato, Sonko Osawa, Toshiyuki Takatsuji: Multi-probe scanning system comprising three laser interferometers and one autocollimator for measuring multiple motion errors of X-Y table in micro-coordinate measuring machine, The 3rd GMSI International Symposium, Tokyo, Japan, 2011, 135.
  • ［33］Satoru Takahashi, Takayoshi Oshima, Toshimune Nagano, Yusuke Kajihara, Kiyoshi Takamasu: Dynamic Control of Lateral Evanescent Light Distribution for Microstereolithography, Proc. of the 6th International Conference on Micro Manufacturing, Tokyo, Japan, 2011, 327-330.
  • ［34］Ping Yang, Tomohiko Takamura, Satoru Takahashi, Kiyoshi Takamasu, Osamu Sato, Sonko Osawa, Toshiyuki Takatsuji: Calibration for multiple motion errors of X-Y table on micro-coordinate measuring machine (M-CMM) by utilizing multi-probe scanning method, ISUPEN2011, International Symposium on Ultraprecision Engineering and Nanotechnology, Tokyo, Japan, 2011.
  • ［35］Kiyoshi Takamasu, Haruki Okitou, Satoru Takahashi, Mitsuru Konno, Osamu Inoue, Hiroki Kawada: Sub-nanometer line width and line profile measurement for CD-SEM calibration by using STEM, Proc. SPIE AL 2011, San Jose, USA, 2011, 7971 797108 1-8.
  • ［36］Dong Wei, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: Femtosecond optical frequency comb's temporal coherence characteristic-based high-accuracy distance measurement, Proc. PGC 2010, Singapore, 2010, 1-6.
  • ［37］Satoru Takahashi, Toshimune Nagano, Yusuke Kajihara, Kiyoshi Takamasu: A Novel Exposure Method Based on Dissolved Oxygen Control for Nano-Stereolithography Using Evanescent Light, Proc. ASPE2010, Atlanta, USA, 2010, 373-376.
  • ［38］Dong Wei, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: Advanced Length Metrology with Pulse Trains’ Destructive Interference by a Femtosecond Optical Frequency Comb, OSA / CLEO/QELS 2010, JWB2.
  • ［39］Narin Chanthawong, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: Absolute Distance Measurement Using High-frequency Repetition Modes of a Mode-locked Fiber Laser, 2010 OSA /FiO/LS, 2010, JTuA52.
  • ［40］Satoru Takahashi, Keisuke Matsuda, Hisamichi Yoshigoe, Kiyoshi Takamasu: Laser Direct Fabrication of Three-Dimensional Microstructures Using Photocatalyst Nanoparticles, Proc. of 4th CIRP International Conference of High Performance Cutting 2010, Gifu, Japan, 2010, 381-384.
  • ［41］Dong Wei, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: A novel length measurement interferometer based on a femtosecond optical frequency comb introduced multi-pulse trains’ interference, Proc. EOS 2010, Paris, France, 2010, 3209.
  • ［42］Takayuki Kurihara, Ryuichi Sugimoto, Ryota Kudo, Satoru Takahashi, Kiyoshi Takamasu: Height Measurement of a Particle in Evanescent Field Controlling Penetration Depth, Proc. 10th ISMQC, Osaka, Japan, 2010, E5-139-1-4.
  • ［43］Ping Yang, Shusaku Shibata, Tomohiko Takamura, Satoru Takahashi, Kiyoshi Takamasu, Osamu Sato, Sonko Osawa, Toshiyuki Takatsuji: A Three Laser Interferometers and One Autocollimator System for Measuring the Yaw and Straightness Errors of a X-Y Stage on High Precision CMM, Proc. 10th ISMQC, Osaka, Japan, 2010, E3-058-1-4.
  • ［44］Hirokazu Matsumoto, Satoru Takahashi, Kiyoshi Takamasu: Super-Heterodyne Interferometric Length Measurement Using the Repetition Frequency of an Optical Frequencies Comb, Proc. 10th ISMQC, Osaka, Japan, 2010, E1-047-1-4.
  • ［45］Kazumasa Isaka, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: New Optical Distance Measurement Without a Prism Refractor Using an Optical Frequency Comb Laser, Proc. 10th ISMQC, Osaka, Japan, 2010, D4-062-1-4.
  • ［46］Dong Wei, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: Advanced Absolute Length Metrology Based On Pulse Trains' Constructive Interference - Towards Measurements of Meter Order with an Accuracy of Nano Order -, Proc. 10th ISMQC, Osaka, Japan, 2010, C1-001-1-4.
  • ［47］Ryota Kudo, Shin Usuki, Satoru Takahashi, Kiyoshi Takamasu: Resolution Characteristics of Super-Resolution Optical Inspection Using Standing Wave Illumination, Proc. 10th ISMQC, Osaka, Japan, 2010, B3-134-1-4.
  • ［48］Muzheng Xiao, Satomi Jujo, Satoru Takahashi, Kiyoshi Takamasu: Profile Measurement of Large Aspheric Optical Surface by Scanning Deflectometry with Rotatable Mirror - Enlarging Measuring Range of Autocollimator -, Proc. 10th ISMQC, Osaka, Japan, 2010, B3-017-1-4.
  • ［49］S. Usuki, R. Kudo, S. Takahashi, K. Takamasu : Multiple image reconstruction for high-resolution optical imaging using structured illumination, Proc. SPIE. 7800, Image Reconstruction from Incomplete Data VI 78000I (August 19, 2010) doi: 10.1117/12.861966.
  • ［50］W. Agustinus, A. Hirai, S. Takahashi, K. Takamasu, H. Matsumoto: Improvement of Gauge Block Measurement Without Wringing Using Tandem Low-coherence Interferometer, Proc. of the euspen International Conference, Delft, Netherlands, euspen2010, 2010, 237-240.
  • ［51］K. Takamasu, K. Kuwabara, S. Takahashi, T. Mizuno, H. Kawada: Sub-nanometer Uncertainty Evaluation of Line Width Measurement by Si Lattice Structures of STEM Image, Proc. of the euspen International Conference, Delft, Netherlands, euspen2010, 2010, 116-119.
  • ［52］K. Takamasu, K. Kuwabara, S. Takahashi, T. Mizuno, H. Kawada : Sub-nanometer calibration of CD-SEM line width by using STEM, Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 76381K (April 01, 2010); doi:10.1117/12.846436.
  • ［53］D. Wei, S. Takahashi, K. Takamasu, and H. Matsumoto：Femtosecond Optical Frequency Comb for Volume Temperature Change Measurement, The 8th Pacific Rim Conference on Lasers and Electro-Optics, (IEEE, 2009)WE2-4
  • ［54］S. Usuki, S. Takahashi, K. Takamasu：High-Resolution Optical Imaging Technique Based on Active Control of Spatial Distribution of Structured Illumination, Proceedings of the 12th International Conference on Human and Computers, (2009)112-117
  • ［55］Winarno Agustinus, Akiko Hirai, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto：Novel Measurement Technique of Gauge Block Without Wringing Using a Tandem Low-coherence Interferometer, Proceedings of ASPEN(2009)1A2-5
  • ［56］Dong WEI, Satoru TAKAHASHI, Kiyoshi TAKAMASU, Hirokazu MATSUMOTO：Advanced optical metrology of geometrical quantity based on pulse trains' destructive interference, Proceedings of ASPEN(2009)1D13
  • ［57］Keisuke Matsuda, Satoru Takahashi, Kiyoshi Takamasu：In-process visualization of laser-assisted three-dimensional microfabrication using photocatalyst nanoparticles, Proceedings of ASPEN(2009)2C6
  • ［58］Ryota Kudo, Shin Usuki, Satoru Takahashi, Kiyoshi Takamasu：Algorithm for 2-Dimensional Super-Resolution Optical Inspection for Semiconductor Defects by Using Standing Wave Illumination, Proceedings of ASPEN(2009)2D12
  • ［59］Shin Usuki, Ryota Kudo, Satoru Takahashi, Kiyoshi Takamasu：Resolving Power Improvement for Optical Nano-Defect Measurement by using Sub-Pixel Sampling based on Structured Illumination Shift Method, Proceedings of ASPEN(2009)2P10-8
  • ［60］Kazumasa Isaka, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto：New optical distance measurement without prism using an optical frequency comb laser, Proceedings of ASPEN(2009)2P10-3
  • ［61］R. Kudo, S. Usuki, S. Takahashi, and K. Takamasu：Fundamental verification for 2-dimensional super-resolution optical inspection for semiconductor defects by using standing wave illumination shift, XIX IMEKO World Congress, (2009)106-111
  • ［62］K. Takamasu, S. Takahashi, W. Tao, R. Furutani, M Abbe：Uncertainty evaluation for coordinate metrology by intelligent measurement，Proceedings of ISMTII(2009)1-006_1-010
  • ［63］S. Takahashi, R. Kudo, S. Okada, S. Usuki, K. Takamasu：Experimental verification of super-resolution microscopy using standing evanescent light with image retrieval，euspen 2009, (San Sebastian, Jun)(2009) 171-174
  • ［64］D. Wei, S. Takahashi, K. Takamasu, and H. Matsumoto：Study on the temporal coherence function of a femtosecond optical frequency comb, Optical Measurement Systems for Industrial Inspection VI, (SPIE) Vol. 7389 (2009)73891-73898
  • ［65］S. Takahashi, T. Nagao, S. Minamiguchi, S. Usuki, K. Takamasu：Development of residual layer thickness measurement system for nano-imprint lithography based on near-field optics，euspen 2008, (Zurich, May)(2008) 295-299
  • ［66］K. Takamasu, S. Takahashi, M. Abbe, R. Furutani：Uncertainty Estimation for Coordinate Metrology: Calibration, Form Deviation and Strategy of Measurement，(ISMTII2007)1-4.
  • ［67］S. Takahashi, S. Okada, H. Nishioka, S. Usuki, K. Takamasu：Analysis of Lateral Resolution Improvement for Fluorescence Microscopy using Standing Evanescent Light，(ISMTII2007)45-48.
  • ［68］Shujie Liu, Kentaro Watanabe, Satoru Takahashi, Kiyoshi Takamasu：Intelligent Profile Measurement for Wide-Area Resist Surface Using Multi-Sensor AFM System，(ISMTII2007)231-234
  • ［69］S. Usuki, H. Nishioka, S. Takahashi, K. Takamasu：Experimental Verification for Super-resolution Optical Inspection for Semiconductor Defect by using Standing Wave Illumination Shift，(ISMTII2007)387-390.
  • ［70］Y. Kajihara, T. Takeuchi, S. Takahashi, K. Takamasu：An Optical and Confocal Microscopic System for Nanostereolithography Using Evanescent Light，(ISMTII2007)79-82.
  • ［71］S. Takahashi, M. Okuno, Y. Kajihara, K. Takamasu：Development of laser-assisted microfabrication sysetm for three-dimensional metal structures by photocatalysis，euspen 2007, (Germany, May)(2007)529-532
  • ［72］S. Minamiguchi, S. Usuki, S. Takahashi, K. Takamasu：Thin Film Thickness Measurement for Evaluation of Residual layer of Nano-Imprint Lithography Using Near-Field Optics，9th International Symposium on Measurement and Quality Control (ISMQC 2007) 167-172
  • ［73］Kiyoshi Takamasu, Keisuke Yoshida, Tatsuya Senoo, Xin Chen, Kiyoshi Kotani, Satoru Takahashi：Calibration of 6 DOF Parallel Mechanism Driven by Planar Motors，9th International Symposium on Measurement and Quality Control (ISMQC 2007) 178-183
  • ［74］Satoru Takahashi：Study on Micro 3D Fabrication and Nano Scale Metrology Using Localized Light Energy，Proceedings of 2007 U.S.–Japan Young Researchers Exchange Program in Nanotechnology (University of North Carolina at Charlotte)(2007)
  • ［75］S. Usuki, H. Nishioka, S. Takahashi, K. Takamasu：Development of super-resolution optical inspection system for semiconductor defects using standing wave illumination shift，Proc. of SPIE Vol. 6375, (Boston, USA, October 2006)，(2006)637508
  • ［76］Masaki Okuno, Tasuku Aso, Satoru Takahashi, Kiyoshi Takamasu：A Novel Microfabrication Technique for Three-Dimensional Metal Structures by Photocatalysis，ASPE 2006 (21st Annual Meeting, October, 2006, Monterey, USA)，(2006)301-304
  • ［77］Yusuke Kajihara, Toru Takeuchi, Satoru Takahashi, Kiyoshi Takamasu：Development of a nano-stereolithography system using evanescent light for submicron fabrication，ASPE 2006 (21st Annual Meeting, October, 2006, Monterey, USA)，(2006)111-114
  • ［78］Hiroaki Nishioka, Satoru Takahashi, Kiyoshi Takamasu：A Super-Resolution Microscopy with Standing Evanescent Light and Image Reconstruction Method，IMEKO XVIII World Congress, (Brazil Rio de Janeiro, 2006 September)，(2006)TC2-2
  • ［79］S. Liu, S. Nagasawa, S. Takahashi, K. Takamasu：Development of Multi-Ball-Cantilever AFM System for Measuring the Profile of Soft Thin Film Surface，euspen 2006, (Baden, Austria, 2006 May)，(2006)458-461
  • ［80］S. Usuki, H. NIshioka, S. Takahashi, K. Takamasu：Super-resolution optical inspection for semiconductor defects using standing wave shift，SPIE International Symposium on Optomechatronic Technologies (ISOT 2005) (December, Sapporo)，Vol.6049(2005) 60490C-1-11
  • ［81］Shujie Liu, Shuichi Nagasawa, Satoru Takahashi, Kiyoshi Takamasu：Profile Measurement of Resist Surface Using Multi-Ball-Cantilever AFM，SPIE International Symposium on Optomechatronic Technologies (ISOT 2005) (December, Sapporo)，Vol.6049(2005) 604903-1-9
  • ［82］Satoru Takahashi, Yuichi Inazuki, Yusuke Kajihara, Kiyoshi Takamasu：Photofabrication of Periodic Submicron Structures Using Standing Evanescent Light for Nano-Stereolithography，20th Annual ASPE Meeting (Oct 9–14, 2005, Norfolk, Virginia, USA), (2005)371-374
  • ［83］K Takamasu, O Sato, K Shimojima, S Takahashi and R Furutani：Estimation of uncertainty of measurements of 3D mechanisms after kinematic calibration，7th ISMTII2005 (Huddersfield, UK), Sep 13(2005) 186-189
  • ［84］S. Usuki, T. Nakano, S. Takahashi, K. Takamasu：Computer Simulation of Nano-Void Inspection in Low-k Dielectric Materials Using Near-Field Optics，Proc. 5th International conference of the european society for precision engineering and nanotechnology (euspen 2005) (May 8-11, Montpellier, France)，(2005)85-88
  • ［85］G. Olea, O. Sato, H. Kiyosawa, S. Takahashi, K. Takamasu：Experimental Method and Device for Spherical Joint Accuracy Evaluation，Proc. 5th International conference of the european society for precision engineering and nanotechnology (euspen 2005) (May 8-11, Montpellier, France) (2005)475-478
  • ［86］Y. Kajihara, Y. Inazuki, S. Takahashi, K. Takamasu：Study of Nano-Stereolithography Using Evanescent Light，American Society for Precision Engineering(ASPE2004Annual Meeting, Florida, USA, Oct. 24 - 29, 2004)(2004)149-152
  • ［87］S. Takahashi, R. Nakajima, T. Miyoshi, Y. Takaya, T. Yoshioka, T. Hariyama, K. Kimura, T. Nakao, K. Takamasu：Nano-Defects Inspection of Semiconductor Wafer using Evanescent Wave，VDI Berichte, 1844(2004)307-316.
  • ［88］K. Takamasu, S. Koga, S. Takahashi, M. Abbe, R. Furutani S. Ozono：Evaluation of Uncertainty by Form Deviations of Measured Workpieces in Specified Measuring Strategies，8th International Symposium on Measurement and Quality Control in Production (ISMQC2004)(Oct 12-15, 2004, Erlangen, Germany)(2004)535-540
  • ［89］X. Chen, K. Kotani, S. Takahashi, K. Takamasu：Development of Multiple Small Linear Planar Motor System，4th International Conference of the European Society for Precision Engineering and Nanotechnology (euspen2004, Glasgow, UK, May 31 - June 2, 2004)，(2004)252-253
  • ［90］S. Usuki, K. Enami, O. Sato, S. Takahashi, K. Takamasu：Improving the Accuracy of 3D Displacement Measurement using Ring-Shaped Laser Beam and High Resolution CCD, 4th International Conference of the European Society for Precision Engineering and Nanotechnology (euspen2004, Glasgow, UK, May 31 - June 2, 2004) (2004)328-329
  • ［91］T. Yoshioka, T.Miyoshi, Y.Takaya, S.Takahashi：Study on Particle Detection for Patterned Wafers by Evanescent Light Illumination，4th International Conference of the European Society for Precision Engineering and Nanotechnology (euspen2004, Glasgow, UK, May 31 - June 2, 2004)，(2004)338-339
  • ［92］J. Wang, T. Miyoshi, Y. Takaya, S. Takahashi, Y. Maeno: Detection of defects on the paint panel surface of a car body using laser scattering method, Proceedings of the International Conference on Leading Edge Manufacturing in 21st Century,(2003)125-128
  • ［93］R. Tsujio, T. Miyoshi, Y. Takaya, S. Takahashi, K. Kimura: Fundamental properties of chemical mechanical polishing for Copper layer assisted by optical radiation pressure, Proceedings of the International Conference on Leading Edge Manufacturing in 21st Century,(2003)11-14
  • ［94］T. Yoshioka, T. Miyoshi, Y. Takaya, S. Takahashi, K. Takamasu: Study on particle detection for patterned wafers by evanescent light illumination -evanescent light scattering simulation by means of FDTD method-, Proceedings of the International Conference on Leading Edge Manufacturing in 21st Century,(2003)129-132
  • ［95］H. Nishino, T. Miyoshi, Y. Takaya, and S. Takahashi：Nonlaminate Micro Photo-stereolithography using LSC Live-motion Mask, 3rd International Symposium on Laser Precision Microfabrication, Vol.4830(2003) 201-205
  • ［96］R. Nakajima, T. Miyoshi, Y. Takaya, S. Takahashi：Internal Defect Detection in the Vicinity of SI Wafer Surface Using Evanescent Wave，Proceedings of XVII IMEKO World Congress,(2003)1819-1822
  • ［97］A. Taguchi, T. Miyoshi, Y. Takaya, S. Takahashi: High Precision Instrument for Micro Surface Profile Measurement Based on Optical Inverse Scattering Phase Method, Proceedings of XVII IMEKO World Congress,(2003)1838-1841
  • ［98］Panart Khajornrungruang, Takashi Miyoshi, Yasuhiro Takaya, Satoru Takahashi, Takashi Harada, Soichiro Isago：Novel Edge Profile Measurement of Micro Cutting Tool by Laser Diffraction，Proceedings of the euspen International Topical Conference (euspen'03), (2003) 463-466
  • ［99］Keiichi KIMURA, Takashi MIYOSHI, Yasuhiro TAKAYA, and Satoru TAKAHASHI：Corrective Planarization Method Using Chemical Mechanical Polishing Assisted by Laser Particle Trapping, Proceedings of the 17th American Society for Precision Engineering Annual Meeting (ASPE'02), (2002), 37-40
  • ［100］Satoru TAKAHASHI, Takashi MIYOSHI, Yasuhiro TAKAYA, and Takahiro ABE：New Optical Measurement Technique for Si Wafer Surface Defects Using Annular Illumination with Crossed Nicols, Proceedings of the 17th American Society for Precision Engineering Annual Meeting (ASPE'02), (2002), 41-46
  • ［101］Yasuhiro TAKAYA, Masatoshi NISHIKAWA, Satoru TAKAHASHI, and Takashi MIYOSHI：The Microprobe for Nano-Positional Detection Using Optically Forced Vibrationi Method, Proceedings of the 17th American Society for Precision Engineering Annual Meeting (ASPE'02), (2002), 367-372
  • ［102］Masatoshi NISHIKAWA, Yasuhiro TAKAYA, Satoru TAKAHASHI, Masahiro UEKITA, Takashi MIYOSHI：Probing Technique for Microparts Using Optically Trapped Particle by Annular Beam, Proceedings of International Symposium on Photonics in Measurement, (2002) 103-108
  • ［103］Atsushi TAGUCHI, Takashi MIYOSHI, Yashuhiro TAKAYA, and Satoru TAKAHASHI：Optical Inverse Scattering Phase Method for Nano-Inprocess Measurement of Micro Surface Profile, Proceedings of SPIE's Laser Metrology Applied to Science, Industry and Everyday life, SPIE, 4900 （2002）739-746
  • ［104］Ryusuke NAKAJIMA, Takashi MIYOSHI, Yasuhiro TAKAYA, and Satoru TAKAHASHI, Mitsunori Fujita：Novel Measurement Method for Nano-Defects of Si Wafer Surface Using Evanescent Wave, Proceedings of the 3rd International Conference and 4th General Meeting of the european society for precision engineering and nanotechnology (euspen'02), (2002) 485-488
  • ［105］Taeho HA, Takashi MIYOSHI, Yasuhiro TAKAYA, and Satoru TAKAHASHI：Evaluation of Microdefects on SiO2 Filmed Wafer Surface form the Scattering Light, Proceedings of the 3rd International Conference and 4th General Meeting of the european society for precision engineering and nanotechnology (euspen'02), (2002) 745-748
  • ［106］Hideaki NISHINO, Takashi MIYOSHI, Yasuhiro TAKAYA, and Satoru TAKAHASHI：Nonlaminate Micro Photo-Stereolithography using LCD Live-Motion Mask, Proceedings of International Congress on Laser Advanced Materials Processing, SPIE,4830 (2002)201-205
  • ［107］Taeho HA, Takashi MIYOSHI, Yasuhiro TAKAYA, and Satoru TAKAHASHI：Analysis of Defects on SiO2 filmed wafer -Evaluation of CMP Defect Detection Schemes using Computer simulation (BEM), Proceedings of the 10th International Conference on Production Engineering (ICPE'01) , (2001) 684-688
  • ［108］Keiichi KIMURA, Takashi MIYOSHI, Yasuhiro TAKAYA, and Satoru TAKAHASHI：Laser Assisted Chemical Mechanical Polishing for Planarization, Proceedings of the 16th American Society for Precision Engineering Annual Meeting (ASPE'01), (2001) 537-540
  • ［109］Satoru TAKAHASHI, Takashi MIYOSHI, and Yasuhiro TAKAYA：New Optical Measurement Technique for Si Wafer Surface Defects Using Darkfield Optical System with Annular Laser Beam, Proceedings of 5th International Symposium on Measurement Technology and Intelligent Instruments (ISMTII'01), (2001) 13-19
  • ［110］Yasuhiro TAKAYA, Satoru TAKAHASHI, and Takashi MIYOSHI：FDTD Simulation of IR Evanescent Light for Nanodefects Inspection in Polished Si Wafer Subsurface, Proceedings of the 5th International Symposium on Measurement Technology and Intelligent Instruments (ISMTII'01), (2001) 21-25
  • ［111］Satoru TAKAHASHI, Takashi MIYOSHI, Yasuhiro TAKAYA, and Ryusuke NAKAJIMA：Nano-Defects Detection of Si Wafer Surface Using Evanescent Light -Computer Simulation by Means of FDTD Method, Proceedings of the 2nd International Conference and 3rd General Meeting of the european society for precision engineering and nanotechnology (euspen'01), (2001) 102-105
  • ［112］Satoru TAKAHASHI, Takashi MIYOSHI, and Yasuhiro TAKAYA：Automatic Defects Measurement On Silicon Wafer Surface By Laser Scattered Defect Pattern, Proceedings of the ASME Manufacturing Engineering Division (ASME IMECE'00), (2000) 209-214
  • ［113］Yasuhiro TAKAYA, Satoru TAKAHASHI, and Takashi MIYOSHI：Nano-positional Detection Using Laser Trapping Probe for Microparts, the 15th America Society for Precision Engineering Annual Meeting (ASPE'00), (2000) 584-587
  • ［114］Jian BAI, Yasuhiro TAKAYA, Takashi MIYOSHI, and Satoru TAKAHASHI：Simulation for Laser Trapping on Arbitrary Shaped Particles, Proceedings of the 15th American Society for Precision Engineering Annual Meeting (ASPE'00), (2000) 336-339
  • ［115］Yasuhiro TAKAYA, Satoru TAKAHASHI, and Takashi MIYOSHI：Microcrack Evaluation using Laser Backscattering, Proceedings of the 16th IMEKO World Congress, II, (2000) 301-306
  • ［116］Satoru TAKAHASHI, Takashi MIYOSHI, and Yasuhiro TAKAYA： Patterned Wafer Defects Inspection by Laser Scattering Image, Proceedings of the 16th IMEKO World Congress, II, (2000) 295-299
  • ［117］Takashi MIYOSHI, Yasuhiro TAKAYA, and Satoru TAKAHASHI：Laser Trapping Micro-probe for Nano-CMM, Proceedings of the 16th IMEKO World Congress, II, (2000) 235-241
  • ［118］Takayuki GOTOH, Takashi MIYOSHI, Yasuhiro TAKAYA, and Satoru TAKAHASHI：Surface Fitting Based on Optical 3-D Measurement, Proceedings of the 16th IMEKO World Congress, VIII, (2000) 109-114
  • ［119］Yasuhiro TAKAYA, Atsushi TAGUCHI, Satoru TAKAHASHI, and Takashi MIYOSHI：Study on 3-D Laser Inverse Scattering Phase Method for Evaluationg Microstructure, Proceeding of SPIE's International Symposium on Process Control and Inspection for Industry, SPIE, 4222（2000）44-47．
  • ［120］Terutake HAYASHI, Takashi MIYOSHI, Yasuhiro TAKAYA, and Satoru TAKAHASHI：Nonlaminate Micro Stereolithography Using TFT LCD, Proceedings of the 2nd euspen Topical Conference on Fabrication and Metrology in Nanotechnology (euspen'00), (2000) 98-106
  • ［121］Satoru TAKAHASHI, Takashi MIYOSHI,Yasuhiro TAKAYA, and Kenji SHIRAI：Optical Measurement of COP Defects on Silicon Wafer Surfac by Laser Scattered Defect Pattern, Proceedings of the 14th America Society for Precision Engineering Annual Meeting (ASPE'99), (1999) 344-347
  • ［122］Satoru TAKAHASHI, Takashi MIYOSHI, and Yasuhiro TAKAYA：Analysis of Laser Scattered Defect Pattern for Optical Measurement of Silicon Wafer Surface Defects, Proceedings of the 9th International Conference on Production Engineering (ICPE'99) , (1999) 384-389
  • ［123］Hiroki SHIMIZU, Takashi MIYOSHI, Yasuhiro TAKAYA, and Satoru TAKAHASHI：Study on Micro-Machining Using Optical Radiation Pressure, Proceedings of the 1st International Conference and 1st General Meeting of the european society for precision engineering and nanotechnology (euspen'99), (1999) 199-202
  • ［124］Yasuhiro TAKAYA, Kazuhiro WAKE, Motoki IZUKURA, Satoru TAKAHASHI, and Takashi MIYOSHI：The Design Model Based In-process Measuring Method of A Three-dimensional Micro-profile by Employing The Laser Inverse Scattering Phase Reconstruction Method, Proceeding of SPIE's International Symposium on Intelligent Systems and Advanced Manufacturing, SPIE, 3520（1998）170-179
  • ［125］Yasuhiro TAKAYA, Noriaki SATO, Hiroki SHIMIZU, Satoru TAKAHASHI, and Takashi MIYOSHI：Fundamental Characteristics of The Laser Trapping Probe for The Nano-CMM Based on Linnik Microscope Interferometer, Proceedings of the 15th IMEKO World Congress, VIII, (1999) 81-88
  • ［126］Yasuhiro TAKAYA, Seiji TSUJI, Hiroki SHIMIZU, Satoru TAKAHASHI, and Takashi MIYOSHI：Development of the Laser trrapping Probe for the Three Dimensional Coordinate Measurement of Micro Parts, Proceedings of the 4th International Symposium on Measurement Technology and Intelligent Instruments (ISMTII'98), (1998) 196-203
  • ［127］Satoru TAKAHASHI, Takashi MIYOSHI, and Yasuhiro TAKAYA：Development of Silicon Wafer Surface Defects Measurement System Based on Laser Scattered Defect Pattern, Proceedings of the 4th International Symposium on Measurement Technology and Intelligent Instruments (ISMTII'98), (1998) 120-125
  • ［128］Yasuhiro TAKAYA, Satoru TAKAHASHI, and Takashi MIYOSHI：Profile Estimation of Ultra-Precision Diamond Turned Surfaces by Laser Diffraction Method, Proceedings of the 6th International IMEKO Symposium on Laser Metrology for Precision Measurement and Inspection in Industry, (1998) 643-650
  • ［129］Takashi MIYOSHI, Yasuhiro TAKAYA, Satoru TAKAHASHI, and Seojoon LEE：3D Profile On-machine Measurement Using Optical Ring Image Sensor, Proceedings of the International Conference on Micromechatronics for Information and Precision Equipment (MIPE'97), (1997) 190-195
  • ［130］Yasuhiro TAKAYA, Satoru TAKAHASHI, Takashi MIYOSHI, and Katsumasa Saito：Study on The Laser Trapping Probe for The Nano-CMM, Proceedings of the 14th IMEKO World Congress, VIII, (1997) 28-33
  • ［131］Satoru TAKAHASHI, Takashi MIYOSHI, and Yasuhiro TAKAYA：Inspection And Discrimination of Silicon Wafer Surface Defects by Laser Scattered Defect Pattern, Proceedings of the 14th IMEKO World Congress, VIII, (1997) 159-164
  • ［132］Yasuhiro TAKAYA, Takashi MIYOSHI, and Satoru TAKAHASHI：The Laser Inverse Scattering Method for Measuring a Micro-profile in Micromachining Process, Proceedings of the 4th International IMEKO Symposium on Laser Metrology for Precision Measurement and Inspection in Industry, (1996) 45-54
  • ［133］Satoru TAKAHASHI, Takashi MIYOSHI, and Yasuhiro TAKAYA：Study on Nano-inprocess Measurement of Silicon Wafer Surface Defects by Laser Scattered Defect Pattern, Proceedings of the 3rd International Symposium on Measurement Technology and Intelligent Instruments (ISMTII'96), (1996) 243-250

3. 解説論文、総合報告、著書 等

  • ［1］高橋哲（分担執筆）：「1.6 超解像による半導体欠陥検査」項および「3.2.3(c) 材料分野・原子間力顕微鏡」項，ナノ・マイクロスケール機械工学（石原直，加藤千幸，光石衛編）, 東京大学出版会(2014)
  • ［2］高橋哲：非伝搬局在光の精密・微細ものづくりへの適用（特集：光学技術と他分野との融合による新しい展開），光技術コンタクト，51, 3(2013),　32-38.
  • ［3］王肖南，松本弘一，高橋哲，高増潔 : パルス干渉法による大寸法計測, OPTRONICS(特集：光周波数コムとその応用)，33, 3(2013), 73-79
  • ［4］高橋哲：光励起型三次元ナノマイクロ加工法の新展開（新技術紹介），RadTech Japan -NEWS LETTER-, 86(2012)5-8.
  • ［5］S. Takahashi, K. Takamasu：Novel laser applications to 3-D micromachining and high-resolution measurement for micor/nano-manufacturing, Jsme News -Surface Engineering and Science-, The Japan Society of Mechanical Engineers, 20, 2(2009)8-11
  • ［6］高橋哲，臼杵深，高増潔：定在エバネセント波照明による超解像イメージング（特集:回折限界を超えて），光学, 38,7(2009)364-372
  • ［7］高橋哲，高増潔：メカノオプトプローブによるナノ形状測定（特集: ナノスケールものづくりのための知的計測技術），計測と制御，47,9(2008) 713-719.
  • ［8］高橋哲（分担執筆）：「4. 2. 3．近接場光を利用した半導体ウエハ基板表面の非破壊評価（先端イメージング技術の開発研究）」項，ナノイメージング, NTS(2008)287-294
  • ［9］高橋哲（分担執筆）：「6.6.1. 近接場光を利用した工業計測」項，2006年度光技術動向調査報告書, 光産業技術振興協会(2007)385-389
  • ［10］高橋哲：近接場光を利用した界面・表面層評価技術（特集: 表面特性評価のためのユニーク計測技術），精密工学会誌，73,8(2007)883-887
  • ［11］高橋哲，奥野将樹，高増潔：光触媒ナノ粒子を用いたマイクロ三次元金属構造の創製－三次元ビームスキャンによるマクロ立体構造の直接描画－, 光アライアンス, 18(5), 200(2007)28-31, 52
  • ［12］高橋哲，高増潔：ナノ・マイクロファブリケーションにおける機能表面の先端光計測技術（特集:特集 I ナノテクノロジー），トライボロジー, 21, 2, 234(2007)19-21
  • ［13］高橋哲（分担執筆）：「9. 近接場を利用した検査技術」項，平成18年度先端的外観検査技術に関する調査研究報告書, 日本機械工業連合会，日本オプトメカトロニクス協会(2007)175-184
  • ［14］高橋哲（分担執筆）：「16.8 加工計測（加工学・加工機器）」項，（特集:創立110周年記念機械工学年鑑）日本機械学会誌, 8, 110(2007)61-62
  • ［15］高橋哲（分担執筆）：「11. 光を用いた計測手法（寸法・形状・粗さを測る）」項，図解 砥粒加工技術のすべて（砥粒加工学会編）, 工業調査会(2006)206-207
  • ［16］高橋哲，三好隆志：ナノ・マイクロファブリケーションにおける高分解能光計測技術 エバネッセント光を利用したナノ計測技術とその可能性，検査技術, 11, 3, 113 (2006)1-7
  • ［17］高橋哲，高増潔，三好隆志：エバネッセント光を利用した微細加工と高分解能計測 (特集:ナノ材料にみる近接場光学の新展開)，光アライアンス, 17( 6), 189(2006)1-5,63
  • ［18］高橋哲（分担執筆）：「3.2. 半導体微細加工分野におけるFunctional Inspection」項，平成17年度新製造技術に関する調査研究報告書―製造技術の情報化促進―，日本機械工業連合会，製造科学技術センター(2006)32-42
  • ［19］高橋哲，三好隆志：ナノ・マイクロファブリケーションにおける光学的計測技術のアプローチ（小特集:ナノ・マイクロテクノロジーの視点から見た材料加工技術の最前線），日本機械学会誌, 108, 1040(2005)537-539
  • ［20］高橋哲，梶原優介，高増潔：ナノ光造形法への新しいレーザー応用技術（特集:レーザー応用技術で進化する成形加工），成形加工, 17, 3(2005)161-166
  • ［21］高橋哲：近接場光学を利用したSiウエハ加工表面のナノ欠陥計測（特集:極限の光計測），画像応用技術専門委員会報告, 精密工学会, 17, 5(2003)1-10