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1. 原著論文    2. 国際会議発表    3. 解説論文、総合報告、著書、講演 等

1. 原著論文

  1. Wiroj Sudatham, Hirokazu Matsumoto, Satoru Takahashi, Kiyoshi Takamasu, Non-contact measurement technique for dimensional metrology using optical comb, Measurement 78 (2016) 381–387.
  2. Wiroj Sudatham, Hirokazu Matsumoto, Satoru Takahashi, Kiyoshi Takamasu, Diagonal in space of coordinate measuring machine verification usingan optical-comb pulsed interferometer with a ball-lens target, Precision Engineering, Volume 43, 2016, Pages 486–492.
  3. S. Takahashi, Y. Horita, F. Kaji, Y. Yamaguchi, M. Michihata, K. Takamasu, Concept for laser-assisted nano removal beyond the diffraction limit using photocatalyst nanoparticles, CIRP Annals - Manufacturing Technology 64/1 (2015) 201–204.
  4. 堀田 陽亮，吉越 久倫，松田 恵介，道畑 正岐，高増 潔，高橋 哲，レーザー集光点近傍における光触媒反応を利用した三次元微細構造創製に関する研究，日本機械学会論文集，Vol. 81, No. 832, 2015.
  5. 工藤良太，高橋哲，高増潔，変調照明シフトによる超精密加工表面の超解像光学式欠陥計測に関する研究（第4報）—コヒーレント結像逐次再構成型超解像法の実験的検証—，精密工学会誌，81(7), 684-691, 2015.
  6. Meiyun Chen, Satoru Takahashi, Kiyoshi Takamasu: Development of high-precision micro-roundness measuring machine using a high-sensitivity and compact multi-beam angle sensor, Precision Engineering 42, 2015, 276-28.
  7. 工藤良太，高橋哲，高増潔，変調照明シフトによる超精密加工表面の超解像光学式欠陥計測に関する研究 (第3報):—コヒーレント結像逐次再構成型超解像法の原理—，精密工学会誌 81(6), 562-569, 2015.
  8. Wiroj Sudatham, Hirokazu Matsumoto, Satoru Takahashi, Kiyoshi Takamasu, Verification of the positioning accuracy of industrial coordinate measuring machine using optical-comb pulsed interferometer with a rough metal ball target, Precision Engineering, Vol. 41, 2015, pp.63-67.
  9. Narin Chanthawong, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto, High-accuracy calibration of CMM using temporal-coherence fiber interferometer with fast-repetition comb laser, Key Engineering Materials Vol. 625, pp.66-72.
  10. Narin Chanthawong, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto, Performance evaluation of a coordinate measuring machine’s axis using a high-frequency repetition mode of a mode-locked fiber laser, International Journal of Precision Engineering and Manufacturing, 2014, Volume 15, Issue 8, pp.1507-1512.
  11. Hiroki Yokozeki, Ryota Kudo, Satoru Takahashi, Kiyoshi Takamasu, Lateral resolution improvement of laser-scanning imaging for nano defects detection, Advanced Optical Technologies 3 (4), 2014, pp.425-433.
  12. Kyohei Ishikawa, Tomohiko Takamura, Muzheng Xiao, Satoru Takahashi, Kiyoshi Takamasu, Profile measurement of aspheric surfaces using scanning deflectometry and rotating autocollimator with wide measuring range, Measurement Science and Technology 25 (6), 064008.
  13. Hisamichi Yoshigoe, Shotaro Kadoya, Satoru Takahashi, and Kiyoshi Takamasu: Fabrication and Composition Control of Three-Dimensional Dielectric Metal Microstructure Using Photocatalyst Nanoparticles, International Journal of Automation Technology, 8, 4, (2014) pp. 523-529.
  14. S. Takahashi, H. Yokozeki, D. Fujii, R. Kudo, K. Takamasu: A novel dark field in-process optical inspection method for micro-openings on mirrored surfaces beyond the diffraction limit using active phase control, CIRP Annals - Manufacturing Technology Vol. 63/1, 2014, 465-468.
  15. Muzheng Xiao, Tomohiko Takamura, Satoru Takahashi, Kiyoshi Takamasu: Random error analysis of profile measurement of large aspheric optical surface using scanning deflectometry with rotation stage Original Research Article, Precision Engineering 37, No.3 (2013)599-605.
  16. Xiaonan Wang, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: Spatial positioning measurements up to 150 m using temporal coherence of optical frequency comb Original Research Article, Precision Engineering 37, No.3 (2013)635-639.
  17. S. Takahashi, Y. Ikeda, K. Takamasu: Study on nano thickness inspection for residual layer of nanoimprint lithography using near-field optical enhancement of metal tip, CIRP Annals - Manufacturing Technology Vol. 62/1, 2013, 527-530.
  18. Kenta Matsui, Hirokazu Matsumoto, Satoru Takahashi, Kiyoshi Takamasu: New Non-contact Measurement of Small Inside-diameter Using Tandem Low-coherence Interferometer and Optical Fiber Devices, Key Engineering Materials Vols. 523-524 (2012) pp 871-876.
  19. Taro Onoe, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: Development of a non-contact precision measurement technique using optical frequency combs, Key Engineering Materials Vols. 523-524 (2012) pp 877-882.
  20. Haruki Okito, Satoru Takahashi, Kiyoshi Takamasu: Sub-Nanometer Line Width and Line Profile Measurement Using STEM Images with Metal Coating, Key Engineering Materials Vols. 523-524 (2012) pp 957-960.
  21. T．Kurihara，R．Sugimoto，R．Kudo，S．Takahashi，K．Takamasu： Height Measurement of Single Nano Particle Based on Evanescent Field Modulation，International Journal of Nanomanufacturing, 8(5/6), 2012, 419-431.
  22. S. Takahashi, Y. Kajihara, K. Takamasu: Submicrometer thickness layer fabrication for layer-by-layer microstereolithography using evanescent light, CIRP Annals - Manufacturing Technology Vol. 61/1, 2012, 219-222.
  23. A. Winarno, S. Takahashi, A. Hirai, K. Takamasu and H. Matsumoto: Absolute measurement of gauge block without wringing using tandem low-coherence interferometry, Meas. Sci. Technol. 23 125001.
  24. 工藤良太，高橋哲，高増潔：半導体ベアウエハ表面ナノ欠陥の超解像光学式計測に関する研究，砥粒加工学会誌 Vol.56 No.2, (2012),OCT. pp709-710.
  25. R．Kudo，S．Usuki ，S．Takahashi，K．Takamasu： Influence of standing wave phase error on super-resolution optical inspection for periodic microstructures，Measurement Science and Technology 23，5(2012)，054007，(13pp).
  26. Narin Chanthawong, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: A new method for high-accuracy gauge block measurement using 2 GHz repetition mode of a mode-locked fiber laser, Measurement Science and Technology, 23, 054003, 2012, 1-6.
  27. Muzheng Xiao, Satomi Jujo, Satoru Takahashi, Kiyoshi Takamasu: Nanometer profile measurement of large aspheric optical surface by scanning deflectometry with rotatable devices: Uncertainty propagation analysis and experiments, Precision Engineering Vol. 36, No. 1, 2012, 91-96.
  28. Xiaonan Wang, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: Space position measurement using long-path heterodyne interferometer with optical frequency comb, Optics Express Vol. 20, No. 2, 2012, 2725-2732.
  29. Ping Yang, Tomohiko Takamura, Satoru Takahashi, Kiyoshi Takamasu, Osamu Sato, Sonko Osawa, Toshiyuki Takatsuji: Multi-probe scanning system comprising three laser interferometers and one autocollimator for measuring flat bar mirror profile with nanometer accuracy, Precision Engineering Vol. 35, No. 3,2011, 686-692.
  30. S. Takahashi, R. Kudo, S. Usuki, K. Takamasu: Super resolution optical measurements of nanodefects on Si wafer surface using infrared standing evanescent wave, CIRP Annals - Manufacturing Technology Vol. 60/1, 2011, 523-526.
  31. Ping Yang, Tomohiko Takamura, Satoru Takahashi, Kiyoshi Takamasu, Osamu Sato, Sonko Osawa, Toshiyuki Takatsuji: Development of high-precision micro-coordinate measuring machine: Multi-probe measurement system for measuring yaw and straightness motion error of XY linear stage, Precision Engineering Vol. 35, No. 2, 2011, 424-430.
  32. Dong Wei, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: Time-of-flight method using multiple pulse train interference as a time recorder, Optics Express, Vol. 19, No. 6, 2011, 4881-4889.
  33. Dong Wei, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: Theoretical Analysis of Length Measurement Using Interference of Multiple Pulse Trains of a Femtosecond Optical Frequency Comb, Japanese Journal of Applied Physics 50(2), 2011, 022701-1-5.
  34. Ryota Kudo, Shin Usuki, Satoru Takahashi, Kiyoshi Takamasu: Simulation-Based Analysis of Influence of Error on Super-Resolution Optical Inspection, Int. J. of Automation Technology Vol. 5, No. 2, 2011, 167-172.
  35. Keisuke Matsuda, Satoru Takahashi, Kiyoshi Takamasu: Development of In-process Visualization System for Laser-assisted Three-dimensional Microfabrication using Photocatalyst Nanoparticles, International Journal of Precision Engineering and Manufacturing, Vol. 11, No. 6, 2010, 811-815.
  36. Kiyoshi Takamasu, Satoru Takahashi, Xin Chen: Uncertainty Estimation in Intelligent Coordinate and Profile Measurement, Key Engineering Materials, Vols. 447-448, 2010, 564-568.
  37. Ping Yang, Shusaku Shibata, Satoru Takahashi, Kiyoshi Takamasu, Osamu Sato, Sonko Osawa, Toshiyuki Takatsuji: A Multi-probe Measurement Method to Evaluate the Yaw and Straightness Errors of XY Stage on High Precision CMM, Key Engineering Materials, Vols. 447-448, 2010, 590-594.
  38. Muzheng Xiao, Satomi Jujo, Satoru Takahashi, Kiyoshi Takamasu: Profile Measurement of Large Aspheric Optical Surface by Scanning Deflectometry with Rotatable Optical Devices - Error Analysis and Pre-experiment -, Key Engineering Materials, Vols. 447-448, 2010, 604-608.
  39. S. Takahashi, K. Watanabe, K. Takamasu：A novel resist surface profilometers for next-generation photolithography using mechano-optical arrayed probe system, Annals of CIRP 59/1(2010)521-524.
  40. D. Wei, S. Takahashi, K. Takamasu, and H. Matsumoto：Simultaneous Observation of High Temporal Coherence between Two Pairs of Pulse Trains Using a Femtosecond-Optical-Frequency-Comb-Based Interferometer, Japanese journal of applied physics 48(2009)070211
  41. D. Wei, S. Takahashi, K. Takamasu, and H. Matsumoto：Femtosecond optical frequency comb-based tandem interferometer, Journal of the European Optical Society -Rapid publications 4(2009), 09043
  42. S. Takahashi, S. Minamiguchi, T. Nakao, S. Usuki, K. Takamasu：Study on residual layer thickness measurement for Nanoimprint Lithography based on near-field optics, Int. J. Surface science and Engineering, 3(3)(2009)178-194
  43. D. Wei, S. Takahashi, K. Takamasu, and H. Matsumoto：Experimental observation of pulse trains' destructive interference with a femtosecond optical frequency-comb-based interferometer, Opt. Lett. 34(2009)2775-2777
  44. Shujie Liu, KentaroWatanabe, Xin Chen, Satoru Takahashi, Kiyoshi Takamasu：Profile measurement of a wide-area resist surface using a multi-ball cantilever system，Precision Engineering 33 (2009) 50–55
  45. Shin Usuki, Hiroaki Nishioka, Satoru Takahashi, Kiyoshi Takamasu：Experimental verification of super-resolution optical inspection for semiconductor defects by using standing wave illumination shift，International Journal of Advanced Manufacturing Technology, 46(2009)（DOI:10.1007/s00170-008-1901-y）863-875
  46. D. Wei, S. Takahashi, K. Takamasu, and H. Matsumoto：Analysis of the temporal coherence function of a femtosecond optical frequency comb, Opt. Express 17(2009), 7011-7018
  47. S. Takahashi, S. Okada, H. Nishioka, S. Usuki, K. Takamasu：Theoretical and numerical analysis of lateral resolution improvement characteristics for fluorescence microscopy using standing evanescent light with image，Meas. Sci. Technol., 19 (8)(2008) 084006
  48. K. Takamasu, S. Takahashi, M. Abbe, R. Furutani：Uncertainty estimation for coordinate metrology with effects of calibration and form deviation in strategy of measurement，Meas. Sci. Technol. 19 (8)(2008)084001
  49. 臼杵深，西岡宏晃，高橋哲，高増潔：変調照明シフトによる超精密加工表面の超解像光学式欠陥計測に関する研究(第2報)－定在波照明シフト実験による解像原理の実験的検証－，精密工学会誌，74 (6) (2008)581-586
  50. Yusuke Kajihara, Toru Takeuchi, Satoru Takahashi, Kiyoshi Takamasu：Development of an In-process Confocal Positioning System for Nanostereolithography Using Evanescent Light，International Journal of Precision Engineering and Manufacturing, 9 (3)(2008) 51-54
  51. S. Liu, K. Watanabe, S. Takahashi, K. Takamasu：Intelligent Profile Measurement for Wide-Area Resist Surface Using Multi-Sensor AFM System，Key Engineering Materials Vols. 381-382(2008)407-410
  52. 臼杵深，西岡宏晃，高橋哲，高増潔：変調照明シフトによる超精密加工表面の超解像光学式欠陥計測に関する研究(第1報)－解像特性の理論的検討－，精密工学会誌，74 (5)(2008)498-503
  53. Y. Kajihara, Y. Inazuki, T. Takeuchi, S. Takahashi, K. Takamasu：Evanescent light photopolymerization and measurement of cure depth in nanostereolithography，Applied Physics Letters 92 (2008)093120
  54. 梶原優介，稲月友一，高橋哲，高増潔：エバネッセント光を利用したナノ光造形法に関する研究(第2報)－定在エバネッセント光を利用した微細周期構造創製－，精密工学会誌，73(8)(2007)934-939
  55. Shujie Liu, Shuichi Nagasawa, Satoru Takahashi, Kiyoshi Takamasu：Development of a Multi-Ball-Cantilever AFM for Measuring Resist Surface，Journal of Robotics and Mechatronics, Vol. 18, No. 6(2006)698-704
  56. 梶原優介，稲月友一，高橋哲，高増潔：エバネッセント光を利用したナノ光造形法に関する研究(第1報)－造形基本特性の理論的・実験的検討－，精密工学会誌，72,11(2006)1391-1396
  57. 吉岡淑江，三好隆志，高谷裕浩，高橋哲：輪帯エバネッセント照明による回路パターン付きSiウエハの表面異物欠陥検出法に関する研究(第1報)－欠陥検出原理とその検証実験－，精密工学会誌，72,7(2006)878-883
  58. 臼杵深，侯冰，清澤圭太朗，江並和宏，平木雅彦，高橋哲，高増潔，大園成夫：リングビームを用いた三次元変位測定法(第2報)－リングイメージの楕円近似による非線形性の改善－，精密工学会誌，72,1(2006)132-136
  59. S. Usuki, K. Enami, M. Hiraki, S. Takahashi, K. Takamasu：Theoretical Analysis and Basic Experiments for the 3D Displacement Measurement Using Ring-Shaped Laser Beam，Key Engineering Materials Vols. 295-296(2005)295-300
  60. S. Takahashi, R. Nakajima, T. Miyoshi, Yasuhiro Takaya, K. Takamasu：Development of an Evanescent Light Measurement System for Si Wafer Microdefect Detection，Key Engineering Materials Vols. 295-296(2005)15-20
  61. T. Ha, T. Miyoshi, Y. Takaya, S. Takahashi：Laser Scattering Measurment of Microdefects on Silicon Oxide Wafer，Key Engineering Materials Vols. 295-296(2005)3-8
  62. A. Taguchi, T. Miyoshi, Y. Takaya, S. Takahashi：Optical 3D profilometer for in-process measurement of microsurface based on phase retrieval technique，Precision Engineering，28，2(2004)152-163
  63. 江並和宏，臼杵深，平木雅彦，高橋哲，高増潔，大園成夫: リングビームを用いた三次元変位測定法(第1報)－理論解析と基礎実験－, 精密工学会誌，69，12(2003)1764-1768
  64. 西野秀昭，三好隆志，高谷裕浩，高橋哲，林照剛，木村景一: 液晶マスクを用いた非積層マイクロ光造形法に関する研究(第2報)－液晶動画像を用いた薄層型積層造形, 精密工学会誌，69，10(2003)1417-1422
  65. 中島隆介，高橋哲，三好隆志，高谷裕浩:赤外エバネッセント光によるシリコンウエハ加工表面層欠陥検出に関する研究(第1報)－理論的・実験的検討－, 精密工学会誌，69，9(2003)1291-1295
  66. Taeho Ha, Takashi Miyoshi, Yasuhiro Takaya, Satoru Takahashi：Size determination of microscratches on silicon oxide wafer surface using scattered light，Precision Engineering，27, 3 (2003) 265-272
  67. 木村景一，三好隆志，高谷裕浩，高橋哲：光放射圧制御微粒子集積現象に基づくCMP加工に関する基礎的研究，精密工学会誌，69，1(2003)89-94
  68. S. Lee, T. Miyoshi, Y. Takaya, S. Takahashi：Non-contact 3D edge profile measurement for die and mold model surface, Journal of Material Processing technology, 127 (2002) 286-291
  69. 高橋 哲，三好隆志，高谷裕浩，立野泰史：光散乱パターンを用いたシリコンウエハ加工表面欠陥のインプロセス計測に関する研究（第２報）−高速欠陥計測法の提案−， 精密工学会誌，68，7（2002）962-966
  70. Takashi MIYOSHI, Satoru TAKAHASHI, Yasuhiro TAKAYA, and Shoichi SHIMADA：High Sensitivity Optical Detection of Oriented Micro defects on Silicon Wafer Surfaces Using Annular Illumination, 2001 CIRP GENERAL ASSEMBLY, CIRP ANNALS, 50, 1（2001）389-392
  71. Seojoon LEE，三好隆志，高谷裕浩，高橋 哲：自由曲面形状の３次元エッジプロファイル計測に関する研究（第１報）−光リング画像によるエッジ自動検出−，精密工学会誌，67，6（2001）997-1002
  72. 林 照剛，三好隆志，高谷裕浩，高橋 哲：液晶マスクを用いた非積層マイクロ光造形法に関する研究（第１報）−濃淡画像による非積層造形−，精密工学会誌，67，4（2001）628-632
  73. Jian BAI, Yasuhiro TAKAYA, Takashi MIYOSHI, and Satoru TAKAHASHI：Dynamic Analysis of Laser Trapping on Arbitrary Shaped Particles as Micro-machining Tools, Journal of the Japan Society for Precision Engineering, 66, 11（2000）1729-1734
  74. Atsushi TAGUCHI, Takashi MIYOSHI, Yasuhiro TAKAYA, Satoru TAKAHASHI, and Katsumasa SAITO：3D Micro-Profile Measurement using Optical Inverse Scattering Phase Method, 2000 CIRP GENERAL ASSEMBLY, CIRP ANNALS, 49, 1（2000）423-426
  75. 高谷裕浩，佐藤憲章，高橋 哲，三好隆志，清水浩貴，渡辺万次郎：ナノCMMレーザトラッピングプローブに関する研究（第１報）−３次元位置検出の基本原理−，精密工学会誌，66，7（2000）1081-1086
  76. 清水浩貴，三好隆志， 高谷裕浩， 高橋 哲：光放射圧を利用した微粒子操作によるマイクロ加工に関する基礎的研究，精密工学会誌，66，6（2000）901-906
  77. Jian BAI, Takashi MIYOSHI, Yasuhiro TAKAYA, and Satoru TAKAHASHI：Computer Simulation for Laser Trapping on Micro-particles with Arbitrary Shape, International Journal of the Japan Society for Precision Engineering, 33, 4（1999）363-368
  78. 聶 朝胤，三好隆志，高谷裕浩，高橋 哲，梁田和雄：金型加工曲面の光リング式3D形状計測センサの開発（第１報）−金属面の光散乱シミュレーションとその検証−，精密工学会誌，65，11（1999）1668-1673
  79. 後藤孝行，高谷裕浩，高橋 哲，三好隆志：高密度測定点データに基づく自由曲面生成法に関する研究（第２報）−擬頂点を用いた曲線曲面・曲面の接続法−，精密工学会誌，65，10（1999）1430-1434
  80. 高橋 哲，三好隆志，高谷裕浩，立野泰史，平田文彦，剱持妥茂哉：光散乱パターンを用いたシリコンウェハ加工表面欠陥のインプロセス計測に関する研究（第１報）−微小付着異物の光散乱パターン特性解析−，精密工学会誌，65，9（1999）1284-1289
  81. Yasuhiro TAKAYA, Satoru TAKAHASHI, Takashi MIYOSHI and Katsumasa SAITO：Development of The Nano-CMM Probe based on Laser Trapping Technology, 1999 CIRP GENERAL ASSEMBLY, CIRP ANNALS, 48, 1（1999）421-424
  82. Yasuhiro TAKAYA, Hiroki SHIMIZU, Satoru TAKAHASHI, and Takashi MIYOSHI：Fundamental Study on The New Probe Technique for The Nano-CMM based on The Laser Trapping and Mirau Interferometer, Measurement, 25, 1（1999）9-18
  83. Satoru TAKAHASHI, Takashi MIYOSHI, Yasuhiro TAKAYA, and Katsumasa SAITO：In-process Measurement Method for Detection and Discrimination of Silicon Wafer Surface Defects by Laser Scattered Defect Pattern, 1998 CIRP GENERAL ASSEMBLY, CIRP ANNALS, 47, 1（1998）459-462
  84. 平田文彦，立野泰史，高橋 哲，高谷裕浩，三好隆志：レーザ光検出パターンによるシリコンウェハ加工表面の欠陥識別，砥粒加工学会誌，42，2（1998）85-86
  85. 枝光毅彦，高谷裕浩，三好隆志，後藤孝行，高橋 哲：高密度計測点群のＢ−スプライン曲面へのあてはめに関する研究−曲率を考慮したノット位置およびパラメータ設定法−，精密工学会誌，62，10（1996）1425-1429
  86. 三好隆志，高谷裕浩，木下浩一，高橋 哲，永田貴之：光逆散乱位相法による微細加工形状計測に関する研究−周期微細溝形状の位相回復−，精密工学会誌，62，7（1996） 958-963

2. 国際会議発表

  1. Kiyoshi Takamasu, Yuuki Iwaki, Satoru Takahashi, Hiroki Kawada, Masami Ikota, Gian F. Lorusso, Naoto Horiguchi: 3D-Profile Measurement of Advanced Semiconductor Features by Reference Metrology, SPIE Advanced Lithography 2016, San Jose, USA, 2016, 9778 1-4
  2. Yuki Suzuki, Hiroyuki Tahara, Masaki Michihata, Satoru Takahashi, Kiyoshi Takamasu: Improvement of lateral shape controlling with nitrogen purge for nano-stereolithography using evanescent light, 8th International Conference on Leading Edge Manufacturing in 21st Century (LEM21), Kyoto Research Park, Kyoto, 2015
  3. Kazuki Tachibana, Masaki Michihata, Satoru Takahashi, Kiyoshi Takamasu: High-sensitive optical measurement of fine particulate defects on Si wafer surface with liquid probe, 8th International Conference on Leading Edge Manufacturing in 21st Century (LEM21), Kyoto Research Park, Kyoto, 2015
  4. Yumi Iwago, Tomohiko Takamura, Yohan Kondo, Youichi Bitou, Satoru Takahashi, Kiyoshi Takamasu: Self Calibration Method for Nanometer Profile Measurement on Large Aspheric Optical Surface, 12th International Symposium on Measurement Technology and Intelligent Instruments (ISMTII 2015), Taipei, Taiwan, 2015, 1097 1-6
  5. Hiromasa Kume, Hiroki Yokozeki, Ryota Kudo, Satoru Takahashi, Kiyoshi Takamasu: Super-Resolution Optical Measurement Method Using Standing Wave Illumination with Three-Beam Interference, 12th International Symposium on Measurement Technology and Intelligent Instruments (ISMTII 2015), Taipei, Taiwan, 2015, 1094 1-6
  6. Taro Onoe, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: (Invited Paper) Non-contact precision profile measurement to rough surface objects with optical frequency combs, 12th International Symposium on Measurement Technology and Intelligent Instruments (ISMTII 2015), Taipei, Taiwan, 2015, 1079 1-5
  7. Satoru Takahashi: (Plenary Keynote) Challenge of Spatial Resolution Improvement of Optical Measurement Method Based on Localized Light Energy, 12th International Symposium on Measurement Technology and Intelligent Instruments (ISMTII 2015), Taipei, Taiwan, 2015, 9
  8. Yosuke Horita, Shotaro Kadoya, Masaki Michihata, Kiyoshi Takamasu, Satoru Takahashi: Fundamental study on fabrication of multi-functional micro device based on micro-beads using photocatalytic reaction, 6th International Conference of Asian Society for Precision Engineering and Nanotechnology (ASPEN2015), Harbin, China, 120 1-4
  9. Chen Meiyun, Genki Miyazaki, Satoru Takahashi, Kiyoshi Takamasu: Roundness measurement machine using multi-beam angle sensor - experimental verification of multi-beam angle sensor, 15th euspen International Conference (euspen2015), Leuven, Belgium, 2015, 125-126
  10. Wiroj Sudatham, Hirokazu Matsumoto, Satoru Takahashi, Kiyoshi Takamasu: Absolute precision measurement for space coordinates metrology using an optical-comb pulsed interferometer with a ball lens target, 15th euspen International Conference (euspen2015)，Leuven, Belgium, 2015, 109-110
  11. Kiyoshi Takamasu, Yuuki Iwaki, Satoru Takahashi, Hiroki Kawada, Masami Ikota, Atsuko Yamaguchi, Gian F. Lorusso, Naoto Horiguchi: Line Profile Measurement of Advanced-FinFET Features by Reference Metrology, Proc. of SPIE 9424, SPIE Advanced Lithography, San Jose, USA, 2015, 942406-1
  12. Fumiya KAJI, Yuki YAMAGUCHI, Satoru TAKAHASHI and Kiyoshi TAKAMASU: Analysis of TiO2 nanotool handling characteristics for microplastic structures based on laser trapping technique, Proc. of the 15th International Conference on Precision Engineering, (2014), Kanazawa, 760-761.
  13. Hiroyuki TAHARA, Kodai MIYAKAWA, Toshimune NAGANO, Satoru TAKAHASHI and Kiyoshi TAKAMASU: Theoretical Analysis of the Spatial Process Resolution of Evanescent Light Exposure for Nano-stereolithography, , Proc. of the 15th International Conference on Precision Engineering, (2014), Kanazawa, 340-343.
  14. Meiyun Chen, Soichiro Ueda, Satoru Takahashi, Kiyoshi Takamasu: Measurement of Surface Roundness Using a Multi-Beam Angle Sensor, 11th Laser Metrology for Precision Measurement and Inspection in Industry (LMPMI2014), Tsukuba, Japan, 2014, B02
  15. Wiroj Sudatham, Hirokazu Matsumoto, Satoru Takahashi, Kiyoshi Takamasu: Non-Contact Measurement Technique for Dimensional Metrology Using Optical Comb, 11th Laser Metrology for Precision Measurement and Inspection in Industry (LMPMI2014), Tsukuba, Japan, 2014, A25
  16. Taro Onoe, Zongluo Yang, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: Precision measurement technique for rough surface object using self-beat signals of optical frequency comb, 14th euspen International Conference (euspen 2014), Dubrovnik, Croatia, 2014, 181-184.
  17. Kiyoshi Takamasu, Kyohei Ishikawa, Tomihiko Takamura, Muzheng Xiao, Satoru Takahashi: Nanometer Profile Measurement of Aspheric Surface Using Scanning Deflectometry and Rotating Autocollimator: Self-Calibration Method of Autocollimator, ASPE/ASPEN Summer Topical Meeting 58, Hawaii, USA, 2014, 121-125.
  18. S. Takahashi, H. Tahara, K. Miyakawa, Y. Kajihara, and K. Takamasu: Fundamental study on the world’s thinnest layered micro-stereolithography using evanescent light, Proc. of ASPE2014 Spring Topical Meeting, 163-166.
  19. Kiyoshi Takamasu, Haruki Okitou, Satoru Takahashi, Mitsuru Konno, Osamu Inoue, Hiroki Kawada: Roughness and Line Profile Measurement of Photoresist and FinFET Features by Cross-Section STEM Image for Reference Metrology, SPIE Advanced Lithography 2014, San Jose, USA.
  20. Taro Onoe, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: Non-contact precision distance measurement technique using two optical frequency combs, 5th International Conference of Asian Society for Precision Engineering and Nanotechnology, (2013), Taipei.
  21. Narin Chanthawong, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: High-accuracy calibration of CMM using temporal-coherence fiber interferometer with fast-repetition comb laser, 5th International Conference of Asian Society for Precision Engineering and Nanotechnology, (2013), Taipei.
  22. Yuki Yamaguchi, Takahiro Sekino, Satoru Takahashi, Kiyoshi Takamasu: Study on Photocatalyzed Nano-removal Processing Tool for Microstereolithography, 5th International Conference of Asian Society for Precision Engineering and Nanotechnology, (2013), Taipei.
  23. Ryota Kudo, Hiroki Yokozeki, Satoru Takahashi, Kiyoshi Takamasu: Coherent Imaging Algorithm of Super-Resolution Optical Inspection with Structured Light Shift, Proc. of The 7th International Conference on Leading Edge Manufacturing in 21st Century, (2013), 177-181.
  24. K. Miyakawa, R. Matsuzawa, S. Takahashi, K. Takamasu: Development of Hybrid Nano-Stereolithography System Using Evanescent Light and Propagating Light for High Throughput Fabrication, , Proc. ASPE2013, St. Paul, USA, 2013, 20-23.
  25. Hiroki Yokozeki, Ryota Kudo, Satoru Takahashi, Kiyoshi Takamasu: Study on Lateral Resolution Improvement of Laser-Scanning Imaging for Nano Defects Inspection, The 11th International Symposium of Measurement Technology and Intelligent Instruments,(2013), Aachen.
  26. Kyohei Ishikawa, Tomohiko Takamura, Muzheng Xiao, Satoru Takahashi, Kiyoshi Takamasu: Nanometer Profile Measurement on Large Aspheric Optical Surface by Scanning Deflectometry with Rotatable Autocollimator -Error Analysis and Measurement Experiments by Using Autocollimator with Wide Measuring Range-, The 11th International Symposium of Measurement Technology and Intelligent Instruments,(2013), Aachen.
  27. H. Yoshigoe, S. Takahashi, K. Takamasu: Experimental Analysis of Laser-Assisted Microfabrication Using TiO2 Nanoparticles, Proceedings of the 13th euspen International Conference, (2013)80-83.
  28. S. Takahashi, J. Li, P. Herman: Laser erasing of ultrafast lase written optical waveguides in fused silica glass, Photonic West, Ultrafast Laser Volume Structuring III, San Francisco, 2013.2.4.
  29. C. Narin, S. Takahashi, K. Takamasu, H. Matsumoto : STEP GAUGE MEASUREMENT USING HIGH-FREQUENCY REPETITIONS OF A MODE-LOCKED FIBER LASER, XX IMEKO World Congress, TC14-O19, 2012
  30. K. Takamasu, S. Takahashi, R. Furutani, M. Abbe: ROUND ROBIN TESTS OF UNCERTAINTY ESTIMATION FOR COORDINATE METROLOGY BY SOFTWARE ERROR PROPAGATION, XX IMEKO World Congress, TC14-O15, 2012.
  31. R. Kudo, S. Takahashi, K. Takamasu : DESIGN VALUE USE TYPE SUPER-RESOLUTION OPTICAL INSPECTION FOR MICROFABRICATED STRUCTURE DEFECTS BY USING STANDING WAVE ILLUMINATION SHIFT, XX IMEKO World Congress, TC14-O8, 2012.
  32. Muzheng Xiao, Tomohiko Takamura, Satoru Takahashi, Kiyoshi Takamasu : NANOMETER PROFILE MEASUREMENT OF LARGE ASPHERIC OPTICAL SURFACE WITH IMPROVED DEFLECTOMETRY METHOD - PRINCIPLE INTRODUCTION AND EXPERIMENTAL VERIFICATION -, XX IMEKO World Congress, SS2-O3, 2012.
  33. S. Takahashi: Super-Resolution Visual Inspection for Microstructures Manufacturing, The 3rd International Conference on Digital Manufacturing & Automation (ICDMA2012).
  34. Muzheng Xiao, Satomi Jujo, Satoru Takahashi, Kiyoshi Takamasu: Nanometer Profile Measurement of Large Aspheric Optical Surface by Scanning Deflectometry with Rotation Devices -Development Of Three Dimensional Measuring Facility and Experiment -, Proc. of the euspen International Conference, Stockholm, Sweden, euspen2012, 2012, 137-140.
  35. Xiaonan Wang, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: Super-heterodyne Interferomter for LengthMeasurment Using the Beat Signal of Laser Diodes and the Optical Frequency Comb, Proc. of the euspen International Conference, Stockholm, Sweden, euspen2012, 2012, 259-262.
  36. Kiyoshi Takamasu, Haruki Okitou, Satoru Takahashi, Mitsuru Konno, Osamu Inoue, Hiroki Kawada: Sub-nanometer calibration of line width measurement and line edge detection by using STEM and sectional SEM, Proc. SPIE Advanced Lithography 2012, San Jose, USA, 2012, 83240X 1-7.
  37. S. Takahashi : Micro 3-D Fabrication and Nano Scale Metrologyby Controlling Localized Light Energy, 4th TU-SNU-UT Joint Symposium, -Design and Manufacturing I-, 2012.3.12.
  38. Xiaonan Wang, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: Absolute Distance Measurement Using Long-Path Heterodyne Interferometer with Optical Frequency Comb, Proc. FIO/LS, OSA, San Jose, USA, 2011, FThH3, 1-2.
  39. Ping Yang, Tomohiko Takamura, Satoru Takahashi, Kiyoshi Takamasu, Osamu Sato, Sonko Osawa, Toshiyuki Takatsuji: Multi-probe system comprising three laser interferometers and one autocollimator for measuring flat bar mirror profile with nanometer accuracy on a high-precision micro-coordinate measuring machine, Proc. SPIE Optics + Photonics, 2011, San Diego, USA, 81330T 1-7.
  40. Muzheng Xiao, Satomi Jujo, Satoru Takahashi, Kiyoshi Takamasu: Nanometer Profile Measurement of Large Aspheric Optical Surface by Scanning Deflectometry with Rotatable Devices, Proc. SPIE Optics + Photonics, San Diego, USA, 2011, 81260R 1-7.
  41. Muzheng Xiao, Satomi Jujo, Kiyoshi Takamasu, Satoru Takahashi: Nanometer Profile Measurement of Large Aspheric Optical Surface by Scanning Deflectometry with Rotatable Devices - Error Analysis and Experiments -, Proc. euspen2011, Como, Italy, 2011, 129-132.
  42. P. Yang, T. Takamura, S. Takahashi, K. Takamasu, O. Sato, S. Osawa, T. Takatsuji: A motion errors and profile measurement system using three laser interferometers and one autocollimator for a high-precision micro-coordinate measuring machine, Proc. euspen2011, Como, Italy, 2011, 150-153.
  43. Xiaonan Wang, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: Experimental evaluation of long path heterodyne interferometers with optical-frequency comb and continuous-wave laser, Proc. ISMTII2011, Daejeon, Korea, 2011, A4-3, 1-5
  44. Ryota Kudo, Shin Usuki, Satoru Takahashi, Kiyoshi Takamasu: Experimental analysis of influence of error on super-resolution optical inspection using standing wave illumination, Proc. ISMTII2011, Daejeon, Korea, 2011, A5-4, 1-6
  45. Guoqing Ding, Xin Chen, Satoru Takahashi, Kiyoshi Takamasu: On-machine profile measurement by multiple sensors scanning method with two kinds of algorithms, Proc. ISMTII2011, Daejeon, Korea, 2011, A7-2, 1-6
  46. Narin Chanthawong, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: High accuracy gauge block measurement using 2-GHz repetitions mode of a mode-locked fiber laser, Proc. ISMTII2011, Daejeon, Korea, 2011, B4-1, 1-4
  47. Tomohiko Takamura, Ping Yang, Satoru Takahashi, Kiyoshi Takamasu, Osamu Sato, Sonko Osawa, Toshiyuki Takatsuji: Development of high precision Coordinate Measuring Machine - Uncertainty analysis of multi-probe method, Proc. ISMTII2011, Daejeon, Korea, 2011, D2-5, 1-6
  48. Xin Chen, Guoqing Ding, Satoru Takahashi, Kiyoshi Takamasu: Self-calibration for two-dimensional stage using least squares solution, Proc. ISMTII2011, Daejeon, Korea, 2011, E3-1, 1-6
  49. Ping Yang, Tomohiko Takamura, Satoru Takahashi, Kiyoshi Takamasu, Osamu Sato, Sonko Osawa, Toshiyuki Takatsuji: Multi-probe scanning system comprising three laser interferometers and one autocollimator for measuring multiple motion errors of X-Y table in micro-coordinate measuring machine, The 3rd GMSI International Symposium, Tokyo, Japan, 2011, 135.
  50. Satoru Takahashi, Takayoshi Oshima, Toshimune Nagano, Yusuke Kajihara, Kiyoshi Takamasu: Dynamic Control of Lateral Evanescent Light Distribution for Microstereolithography, Proc. of the 6th International Conference on Micro Manufacturing, Tokyo, Japan, 2011, 327-330.
  51. Ping Yang, Tomohiko Takamura, Satoru Takahashi, Kiyoshi Takamasu, Osamu Sato, Sonko Osawa, Toshiyuki Takatsuji: Calibration for multiple motion errors of X-Y table on micro-coordinate measuring machine (M-CMM) by utilizing multi-probe scanning method, ISUPEN2011, International Symposium on Ultraprecision Engineering and Nanotechnology, Tokyo, Japan, 2011.
  52. Kiyoshi Takamasu, Haruki Okitou, Satoru Takahashi, Mitsuru Konno, Osamu Inoue, Hiroki Kawada: Sub-nanometer line width and line profile measurement for CD-SEM calibration by using STEM, Proc. SPIE AL 2011, San Jose, USA, 2011, 7971 797108 1-8.
  53. Dong Wei, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: Femtosecond optical frequency comb's temporal coherence characteristic-based high-accuracy distance measurement, Proc. PGC 2010, Singapore, 2010, 1-6.
  54. Satoru Takahashi, Toshimune Nagano, Yusuke Kajihara, Kiyoshi Takamasu: A Novel Exposure Method Based on Dissolved Oxygen Control for Nano-Stereolithography Using Evanescent Light, Proc. ASPE2010, Atlanta, USA, 2010, 373-376.
  55. Dong Wei, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: Advanced Length Metrology with Pulse Trains’ Destructive Interference by a Femtosecond Optical Frequency Comb, OSA / CLEO/QELS 2010, JWB2.
  56. Narin Chanthawong, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: Absolute Distance Measurement Using High-frequency Repetition Modes of a Mode-locked Fiber Laser, 2010 OSA /FiO/LS, 2010, JTuA52.
  57. Satoru Takahashi, Keisuke Matsuda, Hisamichi Yoshigoe, Kiyoshi Takamasu: Laser Direct Fabrication of Three-Dimensional Microstructures Using Photocatalyst Nanoparticles, Proc. of 4th CIRP International Conference of High Performance Cutting 2010, Gifu, Japan, 2010, 381-384.
  58. Dong Wei, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: A novel length measurement interferometer based on a femtosecond optical frequency comb introduced multi-pulse trains’ interference, Proc. EOS 2010, Paris, France, 2010, 3209.
  59. Takayuki Kurihara, Ryuichi Sugimoto, Ryota Kudo, Satoru Takahashi, Kiyoshi Takamasu: Height Measurement of a Particle in Evanescent Field Controlling Penetration Depth, Proc. 10th ISMQC, Osaka, Japan, 2010, E5-139-1-4.
  60. Ping Yang, Shusaku Shibata, Tomohiko Takamura, Satoru Takahashi, Kiyoshi Takamasu, Osamu Sato, Sonko Osawa, Toshiyuki Takatsuji: A Three Laser Interferometers and One Autocollimator System for Measuring the Yaw and Straightness Errors of a X-Y Stage on High Precision CMM, Proc. 10th ISMQC, Osaka, Japan, 2010, E3-058-1-4.
  61. Hirokazu Matsumoto, Satoru Takahashi, Kiyoshi Takamasu: Super-Heterodyne Interferometric Length Measurement Using the Repetition Frequency of an Optical Frequencies Comb, Proc. 10th ISMQC, Osaka, Japan, 2010, E1-047-1-4.
  62. Kazumasa Isaka, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: New Optical Distance Measurement Without a Prism Refractor Using an Optical Frequency Comb Laser, Proc. 10th ISMQC, Osaka, Japan, 2010, D4-062-1-4.
  63. Dong Wei, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto: Advanced Absolute Length Metrology Based On Pulse Trains' Constructive Interference - Towards Measurements of Meter Order with an Accuracy of Nano Order -, Proc. 10th ISMQC, Osaka, Japan, 2010, C1-001-1-4.
  64. Ryota Kudo, Shin Usuki, Satoru Takahashi, Kiyoshi Takamasu: Resolution Characteristics of Super-Resolution Optical Inspection Using Standing Wave Illumination, Proc. 10th ISMQC, Osaka, Japan, 2010, B3-134-1-4.
  65. Muzheng Xiao, Satomi Jujo, Satoru Takahashi, Kiyoshi Takamasu: Profile Measurement of Large Aspheric Optical Surface by Scanning Deflectometry with Rotatable Mirror - Enlarging Measuring Range of Autocollimator -, Proc. 10th ISMQC, Osaka, Japan, 2010, B3-017-1-4.
  66. S. Usuki, R. Kudo, S. Takahashi, K. Takamasu : Multiple image reconstruction for high-resolution optical imaging using structured illumination, Proc. SPIE. 7800, Image Reconstruction from Incomplete Data VI 78000I (August 19, 2010) doi: 10.1117/12.861966.
  67. W. Agustinus, A. Hirai, S. Takahashi, K. Takamasu, H. Matsumoto: Improvement of Gauge Block Measurement Without Wringing Using Tandem Low-coherence Interferometer, Proc. of the euspen International Conference, Delft, Netherlands, euspen2010, 2010, 237-240.
  68. K. Takamasu, K. Kuwabara, S. Takahashi, T. Mizuno, H. Kawada: Sub-nanometer Uncertainty Evaluation of Line Width Measurement by Si Lattice Structures of STEM Image, Proc. of the euspen International Conference, Delft, Netherlands, euspen2010, 2010, 116-119.
  69. K. Takamasu, K. Kuwabara, S. Takahashi, T. Mizuno, H. Kawada : Sub-nanometer calibration of CD-SEM line width by using STEM, Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 76381K (April 01, 2010); doi:10.1117/12.846436.
  70. D. Wei, S. Takahashi, K. Takamasu, and H. Matsumoto：Femtosecond Optical Frequency Comb for Volume Temperature Change Measurement, The 8th Pacific Rim Conference on Lasers and Electro-Optics, (IEEE, 2009)WE2-4
  71. S. Usuki, S. Takahashi, K. Takamasu：High-Resolution Optical Imaging Technique Based on Active Control of Spatial Distribution of Structured Illumination, Proceedings of the 12th International Conference on Human and Computers, (2009)112-117
  72. Winarno Agustinus, Akiko Hirai, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto：Novel Measurement Technique of Gauge Block Without Wringing Using a Tandem Low-coherence Interferometer, Proceedings of ASPEN(2009)1A2-5
  73. Dong WEI, Satoru TAKAHASHI, Kiyoshi TAKAMASU, Hirokazu MATSUMOTO：Advanced optical metrology of geometrical quantity based on pulse trains' destructive interference, Proceedings of ASPEN(2009)1D13
  74. Keisuke Matsuda, Satoru Takahashi, Kiyoshi Takamasu：In-process visualization of laser-assisted three-dimensional microfabrication using photocatalyst nanoparticles, Proceedings of ASPEN(2009)2C6
  75. Ryota Kudo, Shin Usuki, Satoru Takahashi, Kiyoshi Takamasu：Algorithm for 2-Dimensional Super-Resolution Optical Inspection for Semiconductor Defects by Using Standing Wave Illumination, Proceedings of ASPEN(2009)2D12
  76. Shin Usuki, Ryota Kudo, Satoru Takahashi, Kiyoshi Takamasu：Resolving Power Improvement for Optical Nano-Defect Measurement by using Sub-Pixel Sampling based on Structured Illumination Shift Method, Proceedings of ASPEN(2009)2P10-8
  77. Kazumasa Isaka, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto：New optical distance measurement without prism using an optical frequency comb laser, Proceedings of ASPEN(2009)2P10-3
  78. R. Kudo, S. Usuki, S. Takahashi, and K. Takamasu：Fundamental verification for 2-dimensional super-resolution optical inspection for semiconductor defects by using standing wave illumination shift, XIX IMEKO World Congress, (2009)106-111
  79. K. Takamasu, S. Takahashi, W. Tao, R. Furutani, M Abbe：Uncertainty evaluation for coordinate metrology by intelligent measurement，Proceedings of ISMTII(2009)1-006_1-010
  80. S. Takahashi, R. Kudo, S. Okada, S. Usuki, K. Takamasu：Experimental verification of super-resolution microscopy using standing evanescent light with image retrieval，euspen 2009, (San Sebastian, Jun)(2009) 171-174
  81. D. Wei, S. Takahashi, K. Takamasu, and H. Matsumoto：Study on the temporal coherence function of a femtosecond optical frequency comb, Optical Measurement Systems for Industrial Inspection VI, (SPIE) Vol. 7389 (2009)73891-73898
  82. S. Takahashi, T. Nagao, S. Minamiguchi, S. Usuki, K. Takamasu：Development of residual layer thickness measurement system for nano-imprint lithography based on near-field optics，euspen 2008, (Zurich, May)(2008) 295-299
  83. K. Takamasu, S. Takahashi, M. Abbe, R. Furutani：Uncertainty Estimation for Coordinate Metrology: Calibration, Form Deviation and Strategy of Measurement，(ISMTII2007)1-4.
  84. S. Takahashi, S. Okada, H. Nishioka, S. Usuki, K. Takamasu：Analysis of Lateral Resolution Improvement for Fluorescence Microscopy using Standing Evanescent Light，(ISMTII2007)45-48.
  85. Shujie Liu, Kentaro Watanabe, Satoru Takahashi, Kiyoshi Takamasu：Intelligent Profile Measurement for Wide-Area Resist Surface Using Multi-Sensor AFM System，(ISMTII2007)231-234
  86. S. Usuki, H. Nishioka, S. Takahashi, K. Takamasu：Experimental Verification for Super-resolution Optical Inspection for Semiconductor Defect by using Standing Wave Illumination Shift，(ISMTII2007)387-390.
  87. Y. Kajihara, T. Takeuchi, S. Takahashi, K. Takamasu：An Optical and Confocal Microscopic System for Nanostereolithography Using Evanescent Light，(ISMTII2007)79-82.
  88. S. Takahashi, M. Okuno, Y. Kajihara, K. Takamasu：Development of laser-assisted microfabrication sysetm for three-dimensional metal structures by photocatalysis，euspen 2007, (Germany, May)(2007)529-532
  89. S. Minamiguchi, S. Usuki, S. Takahashi, K. Takamasu：Thin Film Thickness Measurement for Evaluation of Residual layer of Nano-Imprint Lithography Using Near-Field Optics，9th International Symposium on Measurement and Quality Control (ISMQC 2007) 167-172
  90. Kiyoshi Takamasu, Keisuke Yoshida, Tatsuya Senoo, Xin Chen, Kiyoshi Kotani, Satoru Takahashi：Calibration of 6 DOF Parallel Mechanism Driven by Planar Motors，9th International Symposium on Measurement and Quality Control (ISMQC 2007) 178-183
  91. Satoru Takahashi：Study on Micro 3D Fabrication and Nano Scale Metrology Using Localized Light Energy，Proceedings of 2007 U.S.–Japan Young Researchers Exchange Program in Nanotechnology (University of North Carolina at Charlotte)(2007)
  92. S. Usuki, H. Nishioka, S. Takahashi, K. Takamasu：Development of super-resolution optical inspection system for semiconductor defects using standing wave illumination shift，Proc. of SPIE Vol. 6375, (Boston, USA, October 2006)，(2006)637508
  93. Masaki Okuno, Tasuku Aso, Satoru Takahashi, Kiyoshi Takamasu：A Novel Microfabrication Technique for Three-Dimensional Metal Structures by Photocatalysis，ASPE 2006 (21st Annual Meeting, October, 2006, Monterey, USA)，(2006)301-304
  94. Yusuke Kajihara, Toru Takeuchi, Satoru Takahashi, Kiyoshi Takamasu：Development of a nano-stereolithography system using evanescent light for submicron fabrication，ASPE 2006 (21st Annual Meeting, October, 2006, Monterey, USA)，(2006)111-114
  95. Hiroaki Nishioka, Satoru Takahashi, Kiyoshi Takamasu：A Super-Resolution Microscopy with Standing Evanescent Light and Image Reconstruction Method，IMEKO XVIII World Congress, (Brazil Rio de Janeiro, 2006 September)，(2006)TC2-2
  96. S. Liu, S. Nagasawa, S. Takahashi, K. Takamasu：Development of Multi-Ball-Cantilever AFM System for Measuring the Profile of Soft Thin Film Surface，euspen 2006, (Baden, Austria, 2006 May)，(2006)458-461
  97. S. Usuki, H. NIshioka, S. Takahashi, K. Takamasu：Super-resolution optical inspection for semiconductor defects using standing wave shift，SPIE International Symposium on Optomechatronic Technologies (ISOT 2005) (December, Sapporo)，Vol.6049(2005) 60490C-1-11
  98. Shujie Liu, Shuichi Nagasawa, Satoru Takahashi, Kiyoshi Takamasu：Profile Measurement of Resist Surface Using Multi-Ball-Cantilever AFM，SPIE International Symposium on Optomechatronic Technologies (ISOT 2005) (December, Sapporo)，Vol.6049(2005) 604903-1-9
  99. Satoru Takahashi, Yuichi Inazuki, Yusuke Kajihara, Kiyoshi Takamasu：Photofabrication of Periodic Submicron Structures Using Standing Evanescent Light for Nano-Stereolithography，20th Annual ASPE Meeting (Oct 9–14, 2005, Norfolk, Virginia, USA), (2005)371-374
  100. K Takamasu, O Sato, K Shimojima, S Takahashi and R Furutani：Estimation of uncertainty of measurements of 3D mechanisms after kinematic calibration，7th ISMTII2005 (Huddersfield, UK), Sep 13(2005) 186-189
  101. S. Usuki, T. Nakano, S. Takahashi, K. Takamasu：Computer Simulation of Nano-Void Inspection in Low-k Dielectric Materials Using Near-Field Optics，Proc. 5th International conference of the european society for precision engineering and nanotechnology (euspen 2005) (May 8-11, Montpellier, France)，(2005)85-88
  102. G. Olea, O. Sato, H. Kiyosawa, S. Takahashi, K. Takamasu：Experimental Method and Device for Spherical Joint Accuracy Evaluation，Proc. 5th International conference of the european society for precision engineering and nanotechnology (euspen 2005) (May 8-11, Montpellier, France) (2005)475-478
  103. Y. Kajihara, Y. Inazuki, S. Takahashi, K. Takamasu：Study of Nano-Stereolithography Using Evanescent Light，American Society for Precision Engineering(ASPE2004Annual Meeting, Florida, USA, Oct. 24 - 29, 2004)(2004)149-152
  104. S. Takahashi, R. Nakajima, T. Miyoshi, Y. Takaya, T. Yoshioka, T. Hariyama, K. Kimura, T. Nakao, K. Takamasu：Nano-Defects Inspection of Semiconductor Wafer using Evanescent Wave，VDI Berichte, 1844(2004)307-316.
  105. K. Takamasu, S. Koga, S. Takahashi, M. Abbe, R. Furutani S. Ozono：Evaluation of Uncertainty by Form Deviations of Measured Workpieces in Specified Measuring Strategies，8th International Symposium on Measurement and Quality Control in Production (ISMQC2004)(Oct 12-15, 2004, Erlangen, Germany)(2004)535-540
  106. X. Chen, K. Kotani, S. Takahashi, K. Takamasu：Development of Multiple Small Linear Planar Motor System，4th International Conference of the European Society for Precision Engineering and Nanotechnology (euspen2004, Glasgow, UK, May 31 - June 2, 2004)，(2004)252-253
  107. S. Usuki, K. Enami, O. Sato, S. Takahashi, K. Takamasu：Improving the Accuracy of 3D Displacement Measurement using Ring-Shaped Laser Beam and High Resolution CCD, 4th International Conference of the European Society for Precision Engineering and Nanotechnology (euspen2004, Glasgow, UK, May 31 - June 2, 2004) (2004)328-329
  108. T. Yoshioka, T.Miyoshi, Y.Takaya, S.Takahashi：Study on Particle Detection for Patterned Wafers by Evanescent Light Illumination，4th International Conference of the European Society for Precision Engineering and Nanotechnology (euspen2004, Glasgow, UK, May 31 - June 2, 2004)，(2004)338-339
  109. J. Wang, T. Miyoshi, Y. Takaya, S. Takahashi, Y. Maeno: Detection of defects on the paint panel surface of a car body using laser scattering method, Proceedings of the International Conference on Leading Edge Manufacturing in 21st Century,(2003)125-128
  110. R. Tsujio, T. Miyoshi, Y. Takaya, S. Takahashi, K. Kimura: Fundamental properties of chemical mechanical polishing for Copper layer assisted by optical radiation pressure, Proceedings of the International Conference on Leading Edge Manufacturing in 21st Century,(2003)11-14
  111. T. Yoshioka, T. Miyoshi, Y. Takaya, S. Takahashi, K. Takamasu: Study on particle detection for patterned wafers by evanescent light illumination -evanescent light scattering simulation by means of FDTD method-, Proceedings of the International Conference on Leading Edge Manufacturing in 21st Century,(2003)129-132
  112. H. Nishino, T. Miyoshi, Y. Takaya, and S. Takahashi：Nonlaminate Micro Photo-stereolithography using LSC Live-motion Mask, 3rd International Symposium on Laser Precision Microfabrication, Vol.4830(2003) 201-205
  113. R. Nakajima, T. Miyoshi, Y. Takaya, S. Takahashi：Internal Defect Detection in the Vicinity of SI Wafer Surface Using Evanescent Wave，Proceedings of XVII IMEKO World Congress,(2003)1819-1822
  114. A. Taguchi, T. Miyoshi, Y. Takaya, S. Takahashi: High Precision Instrument for Micro Surface Profile Measurement Based on Optical Inverse Scattering Phase Method, Proceedings of XVII IMEKO World Congress,(2003)1838-1841
  115. Panart Khajornrungruang, Takashi Miyoshi, Yasuhiro Takaya, Satoru Takahashi, Takashi Harada, Soichiro Isago：Novel Edge Profile Measurement of Micro Cutting Tool by Laser Diffraction，Proceedings of the euspen International Topical Conference (euspen'03), (2003) 463-466
  116. Keiichi KIMURA, Takashi MIYOSHI, Yasuhiro TAKAYA, and Satoru TAKAHASHI：Corrective Planarization Method Using Chemical Mechanical Polishing Assisted by Laser Particle Trapping, Proceedings of the 17th American Society for Precision Engineering Annual Meeting (ASPE'02), (2002), 37-40
  117. Satoru TAKAHASHI, Takashi MIYOSHI, Yasuhiro TAKAYA, and Takahiro ABE：New Optical Measurement Technique for Si Wafer Surface Defects Using Annular Illumination with Crossed Nicols, Proceedings of the 17th American Society for Precision Engineering Annual Meeting (ASPE'02), (2002), 41-46
  118. Yasuhiro TAKAYA, Masatoshi NISHIKAWA, Satoru TAKAHASHI, and Takashi MIYOSHI：The Microprobe for Nano-Positional Detection Using Optically Forced Vibrationi Method, Proceedings of the 17th American Society for Precision Engineering Annual Meeting (ASPE'02), (2002), 367-372
  119. Masatoshi NISHIKAWA, Yasuhiro TAKAYA, Satoru TAKAHASHI, Masahiro UEKITA, Takashi MIYOSHI：Probing Technique for Microparts Using Optically Trapped Particle by Annular Beam, Proceedings of International Symposium on Photonics in Measurement, (2002) 103-108
  120. Atsushi TAGUCHI, Takashi MIYOSHI, Yashuhiro TAKAYA, and Satoru TAKAHASHI：Optical Inverse Scattering Phase Method for Nano-Inprocess Measurement of Micro Surface Profile, Proceedings of SPIE's Laser Metrology Applied to Science, Industry and Everyday life, SPIE, 4900 （2002）739-746
  121. Ryusuke NAKAJIMA, Takashi MIYOSHI, Yasuhiro TAKAYA, and Satoru TAKAHASHI, Mitsunori Fujita：Novel Measurement Method for Nano-Defects of Si Wafer Surface Using Evanescent Wave, Proceedings of the 3rd International Conference and 4th General Meeting of the european society for precision engineering and nanotechnology (euspen'02), (2002) 485-488
  122. Taeho HA, Takashi MIYOSHI, Yasuhiro TAKAYA, and Satoru TAKAHASHI：Evaluation of Microdefects on SiO2 Filmed Wafer Surface form the Scattering Light, Proceedings of the 3rd International Conference and 4th General Meeting of the european society for precision engineering and nanotechnology (euspen'02), (2002) 745-748
  123. Hideaki NISHINO, Takashi MIYOSHI, Yasuhiro TAKAYA, and Satoru TAKAHASHI：Nonlaminate Micro Photo-Stereolithography using LCD Live-Motion Mask, Proceedings of International Congress on Laser Advanced Materials Processing, SPIE,4830 (2002)201-205
  124. Taeho HA, Takashi MIYOSHI, Yasuhiro TAKAYA, and Satoru TAKAHASHI：Analysis of Defects on SiO2 filmed wafer -Evaluation of CMP Defect Detection Schemes using Computer simulation (BEM), Proceedings of the 10th International Conference on Production Engineering (ICPE'01) , (2001) 684-688
  125. Keiichi KIMURA, Takashi MIYOSHI, Yasuhiro TAKAYA, and Satoru TAKAHASHI：Laser Assisted Chemical Mechanical Polishing for Planarization, Proceedings of the 16th American Society for Precision Engineering Annual Meeting (ASPE'01), (2001) 537-540
  126. Satoru TAKAHASHI, Takashi MIYOSHI, and Yasuhiro TAKAYA：New Optical Measurement Technique for Si Wafer Surface Defects Using Darkfield Optical System with Annular Laser Beam, Proceedings of 5th International Symposium on Measurement Technology and Intelligent Instruments (ISMTII'01), (2001) 13-19
  127. Yasuhiro TAKAYA, Satoru TAKAHASHI, and Takashi MIYOSHI：FDTD Simulation of IR Evanescent Light for Nanodefects Inspection in Polished Si Wafer Subsurface, Proceedings of the 5th International Symposium on Measurement Technology and Intelligent Instruments (ISMTII'01), (2001) 21-25
  128. Satoru TAKAHASHI, Takashi MIYOSHI, Yasuhiro TAKAYA, and Ryusuke NAKAJIMA：Nano-Defects Detection of Si Wafer Surface Using Evanescent Light -Computer Simulation by Means of FDTD Method, Proceedings of the 2nd International Conference and 3rd General Meeting of the european society for precision engineering and nanotechnology (euspen'01), (2001) 102-105
  129. Satoru TAKAHASHI, Takashi MIYOSHI, and Yasuhiro TAKAYA：Automatic Defects Measurement On Silicon Wafer Surface By Laser Scattered Defect Pattern, Proceedings of the ASME Manufacturing Engineering Division (ASME IMECE'00), (2000) 209-214
  130. Yasuhiro TAKAYA, Satoru TAKAHASHI, and Takashi MIYOSHI：Nano-positional Detection Using Laser Trapping Probe for Microparts, the 15th America Society for Precision Engineering Annual Meeting (ASPE'00), (2000) 584-587
  131. Jian BAI, Yasuhiro TAKAYA, Takashi MIYOSHI, and Satoru TAKAHASHI：Simulation for Laser Trapping on Arbitrary Shaped Particles, Proceedings of the 15th American Society for Precision Engineering Annual Meeting (ASPE'00), (2000) 336-339
  132. Yasuhiro TAKAYA, Satoru TAKAHASHI, and Takashi MIYOSHI：Microcrack Evaluation using Laser Backscattering, Proceedings of the 16th IMEKO World Congress, II, (2000) 301-306
  133. Satoru TAKAHASHI, Takashi MIYOSHI, and Yasuhiro TAKAYA： Patterned Wafer Defects Inspection by Laser Scattering Image, Proceedings of the 16th IMEKO World Congress, II, (2000) 295-299
  134. Takashi MIYOSHI, Yasuhiro TAKAYA, and Satoru TAKAHASHI：Laser Trapping Micro-probe for Nano-CMM, Proceedings of the 16th IMEKO World Congress, II, (2000) 235-241
  135. Takayuki GOTOH, Takashi MIYOSHI, Yasuhiro TAKAYA, and Satoru TAKAHASHI：Surface Fitting Based on Optical 3-D Measurement, Proceedings of the 16th IMEKO World Congress, VIII, (2000) 109-114
  136. Yasuhiro TAKAYA, Atsushi TAGUCHI, Satoru TAKAHASHI, and Takashi MIYOSHI：Study on 3-D Laser Inverse Scattering Phase Method for Evaluationg Microstructure, Proceeding of SPIE's International Symposium on Process Control and Inspection for Industry, SPIE, 4222（2000）44-47．
  137. Terutake HAYASHI, Takashi MIYOSHI, Yasuhiro TAKAYA, and Satoru TAKAHASHI：Nonlaminate Micro Stereolithography Using TFT LCD, Proceedings of the 2nd euspen Topical Conference on Fabrication and Metrology in Nanotechnology (euspen'00), (2000) 98-106
  138. Satoru TAKAHASHI, Takashi MIYOSHI,Yasuhiro TAKAYA, and Kenji SHIRAI：Optical Measurement of COP Defects on Silicon Wafer Surfac by Laser Scattered Defect Pattern, Proceedings of the 14th America Society for Precision Engineering Annual Meeting (ASPE'99), (1999) 344-347
  139. Satoru TAKAHASHI, Takashi MIYOSHI, and Yasuhiro TAKAYA：Analysis of Laser Scattered Defect Pattern for Optical Measurement of Silicon Wafer Surface Defects, Proceedings of the 9th International Conference on Production Engineering (ICPE'99) , (1999) 384-389
  140. Hiroki SHIMIZU, Takashi MIYOSHI, Yasuhiro TAKAYA, and Satoru TAKAHASHI：Study on Micro-Machining Using Optical Radiation Pressure, Proceedings of the 1st International Conference and 1st General Meeting of the european society for precision engineering and nanotechnology (euspen'99), (1999) 199-202
  141. Yasuhiro TAKAYA, Kazuhiro WAKE, Motoki IZUKURA, Satoru TAKAHASHI, and Takashi MIYOSHI：The Design Model Based In-process Measuring Method of A Three-dimensional Micro-profile by Employing The Laser Inverse Scattering Phase Reconstruction Method, Proceeding of SPIE's International Symposium on Intelligent Systems and Advanced Manufacturing, SPIE, 3520（1998）170-179
  142. Yasuhiro TAKAYA, Noriaki SATO, Hiroki SHIMIZU, Satoru TAKAHASHI, and Takashi MIYOSHI：Fundamental Characteristics of The Laser Trapping Probe for The Nano-CMM Based on Linnik Microscope Interferometer, Proceedings of the 15th IMEKO World Congress, VIII, (1999) 81-88
  143. Yasuhiro TAKAYA, Seiji TSUJI, Hiroki SHIMIZU, Satoru TAKAHASHI, and Takashi MIYOSHI：Development of the Laser trrapping Probe for the Three Dimensional Coordinate Measurement of Micro Parts, Proceedings of the 4th International Symposium on Measurement Technology and Intelligent Instruments (ISMTII'98), (1998) 196-203
  144. Satoru TAKAHASHI, Takashi MIYOSHI, and Yasuhiro TAKAYA：Development of Silicon Wafer Surface Defects Measurement System Based on Laser Scattered Defect Pattern, Proceedings of the 4th International Symposium on Measurement Technology and Intelligent Instruments (ISMTII'98), (1998) 120-125
  145. Yasuhiro TAKAYA, Satoru TAKAHASHI, and Takashi MIYOSHI：Profile Estimation of Ultra-Precision Diamond Turned Surfaces by Laser Diffraction Method, Proceedings of the 6th International IMEKO Symposium on Laser Metrology for Precision Measurement and Inspection in Industry, (1998) 643-650
  146. Takashi MIYOSHI, Yasuhiro TAKAYA, Satoru TAKAHASHI, and Seojoon LEE：3D Profile On-machine Measurement Using Optical Ring Image Sensor, Proceedings of the International Conference on Micromechatronics for Information and Precision Equipment (MIPE'97), (1997) 190-195
  147. Yasuhiro TAKAYA, Satoru TAKAHASHI, Takashi MIYOSHI, and Katsumasa Saito：Study on The Laser Trapping Probe for The Nano-CMM, Proceedings of the 14th IMEKO World Congress, VIII, (1997) 28-33
  148. Satoru TAKAHASHI, Takashi MIYOSHI, and Yasuhiro TAKAYA：Inspection And Discrimination of Silicon Wafer Surface Defects by Laser Scattered Defect Pattern, Proceedings of the 14th IMEKO World Congress, VIII, (1997) 159-164
  149. Yasuhiro TAKAYA, Takashi MIYOSHI, and Satoru TAKAHASHI：The Laser Inverse Scattering Method for Measuring a Micro-profile in Micromachining Process, Proceedings of the 4th International IMEKO Symposium on Laser Metrology for Precision Measurement and Inspection in Industry, (1996) 45-54
  150. Satoru TAKAHASHI, Takashi MIYOSHI, and Yasuhiro TAKAYA：Study on Nano-inprocess Measurement of Silicon Wafer Surface Defects by Laser Scattered Defect Pattern, Proceedings of the 3rd International Symposium on Measurement Technology and Intelligent Instruments (ISMTII'96), (1996) 243-250

3. 解説論文、総合報告、著書、講演 等

  1. S. Takahashi【招待講演】：New developments on micro/nano manufacturing science based on evanescent light，6th International Conference of Manufacturing Technology Engineers (ICMTE2017) & 17th International Manufacturing Conference in China (IMCC2017), 2017.11.24.
  2. S. Takahashi【Keynote】：New Developments for Next-generation Precision Engineering Opened with Localized Light Energy Control，7th International Conference of Asian Society for Precision Engineering and Nanotechnology (ASPEN2017), 2017.11.15.
  3. S. Takahashi【招待講演】：High sensitive and super resolution optical inspection of nanodefects on Si wafer surface using infrared standing evanescent wave，13th International Symposium on Measurement Technology and Intelligent Instruments (ISMTII2017), 2017.9.23.
  4. S. Takahashi【招待講演】：Challenge of Evanescent Light Exposing Micro-Stereolithography，JSAP-OSA Joint Symposia 2016, 2016.9.14.
  5. 高橋哲【招待講演】：マイクロ・ナノ製造のための光エネルギー援用加工計測技術，電子情報通信学会エレクトロニクスソサイエティ・システムナノ技術に関する時限研究専門委員会第4回研究会，2016.6.17
  6. 高橋哲【招待講演】：光でめざすものづくり〜回折限界超越への挑戦〜，東大駒場リサーチキャンパス公開2016，オープニングセレモニー講演，2016.6.3
  7. 高橋哲【招待講演】：構造照明シフトによる超解像光学式欠陥計測技術の開発,精密工学会・超精密位置決め専門委員会・第110回定例会「位置決め技術トピックスから見た動向と注目トピックス」,2016.4.15
  8. S. Takahashi【Keynote】: Challenge of Spatial Resolution Improvement of Optical Measurement Method Based on Localized Light Energy, 12th International Symposium on Measurement Technology and Intelligent Instruments (ISMTII2015)，2015.9.24.
  9. S. Takahashi【招待講演】: Advanced optical inspection for engineering surface beyond the diffraction limit, The UT-NTU Conference at Tokyo 2015 "Emerging Technology Development of Material-Mechanics-Robotics"，東京大学, 2015.12.9
  10. 高橋哲【招待講演】：半導体製造におけるナノ欠陥の高分解能・高感度・光学的計測法，精密工学会プラナリゼーションCMPとその応用技術専門委員会第145回研究会「半導体基板洗浄技術と関連計測技術の最前線」，四ツ谷，2015.10.30
  11. 高橋哲【招待講演】：光計測，自動車技術会公開委員会「加工・計測技術の基本と最新技術」，自動車技術会，東京大学，2015.9.29
  12. 高橋哲【招待講演】：超高分解能顕微技術，光センシング技術部会2015年度第2回講演会「光波を用いたセンシング技術、ナノからサブナノへ向かう光計測技術及び生体計測」，東京大学，2015.9.11
  13. 高橋哲【解説論文】：光で見ること，測ることのギャップ光計測とメトロロジー(<小特集>先進ものづくりとメトロロジー: 測れないものは,つくれない?)，日本機械学会誌118 (1164)，2015，664-667
  14. 高橋哲【招待講演】：蛍光修飾を施さない回折限界超越観察技術の開発, 第135回微小光学研究会（応用物理学会）「微小光学を拓く数学：予測・復元・逆問題へのアプローチ」, 2015.3.5
  15. 高橋哲【招待講演】：エバネッセント光の工学応用 ～一括露光型マイクロ光造形法の露光エネルギーへの展開とその展望～, 第82回レーザ加工学会講演会,2015.1.13
  16. 高橋哲【招待講演】：光によるマイクロ製造科学の新展開, 第34回 理研シンポジウム「マイクロファブリケーション研究の最新動向～光応用加工・精密計測，レーザー加工の最前線～」, 2014.5.23
  17. 高橋哲【招待講演】：光による微細欠陥精密測定－近接場光から変調照明利用型まで－, 精密工学会/精密測定技術振興財団第367回講演会「“はかる”を知る，精密測定の理論と最新動向」, 2014, 12-16, 2014.6.16
  18. 高橋哲（分担執筆）：「1.6 超解像による半導体欠陥検査」項および「3.2.3(c) 材料分野・原子間力顕微鏡」項，ナノ・マイクロスケール機械工学（石原直，加藤千幸，光石衛編）, 東京大学出版会(2014)
  19. 高橋哲【解説論文】：非伝搬局在光の精密・微細ものづくりへの適用（特集：光学技術と他分野との融合による新しい展開），光技術コンタクト，51, 3(2013)，32-38.
  20. 高橋哲【招待講演】：エバネッセント光を用いたナノ光造形，日本塑性加工学会ナノマイクロ加工分科会第10回セミナー－ナノマイクロ加工技術の現状と今後の展望－，2013.3.11
  21. 高橋哲【招待講演】：回折限界超越を狙ったレーザー応用技術，日本オプトメカトロニクス協会フォトンテクノロジー技術部会講演会，機械振興会館，東京都，2013.3.5
  22. 王肖南，松本弘一，高橋哲，高増潔【解説論文】 : パルス干渉法による大寸法計測, OPTRONICS(特集：光周波数コムとその応用)，33, 3(2013), 73-79
  23. S. Takahashi【招待講演】: Advanced Optical Measurement for Next-Generation micro/nano Manufacturing., DST-JSPS Asia Academic Seminar 2012 on Manufacturing, Design and Innovation, 2012
  24. S. Takahashi【Keynote】: Super-Resolution Visual Inspection for Microstructures Manufacturing, The 3rd International Conference on Digital Manufacturing & Automation (ICDMA2012), 2012.8.1
  25. 高橋哲【招待講演】：光励起型三次元ナノマイクロ加工法の新展開（新技術紹介），RadTech Japan -NEWS LETTER-, 86(2012)5-8. 第126回ラドテック研究会講演会,2012.4.17
  26. S.Takahashi【招待講演】 : Micro 3-D Fabrication and Nano Scale Metrologyby Controlling Localized Light Energy, 4th TU-SNU-UT Joint Symposium, -Design and Manufacturing I-, 2012.3.12
  27. 高橋哲【その他】：電子投稿・校閲システムの導入ワーキンググループの活動を振り返って，精密工学会誌 Vol. 77, No. 2，2011，236-239
  28. Kiyoshi Takamasu, Haruki Okitou, Satoru Takahashi, Mitsuru Konno, Osamu Inoue, Hiroki Kawada【招待講演】: Sub-nanometer line width and line profile measurement for CD-SEM calibration by using STEM, Proc. SPIE AL 2011, San Jose, USA, 7971 797108 1-8
  29. 高橋哲【研究報告】：エバネッセント・マルチフォトンプローブの生成および解像力解析（平成21年度研究報告），豊田研究報告 (63), 177-180, 2010-05，177-180
  30. 高橋哲【その他】：「夢」は光を道具とした究極のものづくりの実現，日経BP Techno Dream，2010，42-43
  31. 高橋哲【招待講演】：回折限界超越による精密ものづくり計測評価技術の展開，光学会，Optics & Phtonics Japan 2010シンポジウム－ものづくりにおける精密光計測－，2010.11.9
  32. S. Usuki, R. Kudo, S. Takahashi, K. Takamasu【招待講演】: Multiple image reconstruction for high-resolution optical imaging using structured illumination, Proc. SPIE. 7800, Image Reconstruction from Incomplete Data VI 78000I, 2010.8.19
  33. K. Takamasu, K. Kuwabara, S. Takahashi, T. Mizuno, H. Kawada【招待講演】 : Sub-nanometer calibration of CD-SEM line width by using STEM, Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 76381K, 2010.4.1
  34. 高橋哲【招待講演】：変調エバネッセント波照明による解像力向上，応用物理学会 光波センシング技術研究会第57回応用物理学関係連合講演会シンポジウム－光波センシングを切り拓くイメージング技術の進展－，2010.3.19.
  35. S. Takahashi, K. Takamasu【解説論文】：Novel laser applications to 3-D micromachining and high-resolution measurement for micor/nano-manufacturing, Jsme News -Surface Engineering and Science-, The Japan Society of Mechanical Engineers, 20, 2(2009)8-11
  36. 高橋哲【招待講演】：局在光を利用したマイクロ・ナノ加工計測技術の開発，香川大学技術交流協力会，光学計測技術交流グループ研究,会2009.12.18
  37. 高橋哲【研究報告】：エバネッセント・マルチフォトンプローブの解像メカニズムの解析，豊田研究報告 (62)，2009，223-228
  38. 高橋哲，臼杵深，高増潔【解説論文】：定在エバネセント波照明による超解像イメージング（特集:回折限界を超えて），光学, 38,7(2009)364-372
  39. 高橋哲【招待講演】：局在光による超精密モノづくり援用計測技術の展開，「超微粒C60フラーレン応用超精密ポリシングの研究」事業創出研究会，2009.9.18
  40. 高橋哲【その他】：75周年記事業報告，3.3電子校閲システムの導入，精密工学会誌 75 (12)，2009, 1486
  41. 高橋哲，高増潔【解説論文】：メカノオプトプローブによるナノ形状測定（特集: ナノスケールものづくりのための知的計測技術），計測と制御，47,9(2008) 713-719.
  42. 高橋哲【招待講演】：局在光制御による精密加工・計測の新展開，東京大学生産技術研究所 プロダクションテクノロジー研究会 第1回講演会, 2008.3.21．
  43. 高橋哲（分担執筆）：「4. 2. 3．近接場光を利用した半導体ウエハ基板表面の非破壊評価（先端イメージング技術の開発研究）」項，ナノイメージング, NTS(2008)287-294
  44. 高橋哲（分担執筆）：「6.6.1. 近接場光を利用した工業計測」項，2006年度光技術動向調査報告書, 光産業技術振興協会(2007)385-389
  45. 高橋哲【招待講演】：エバネッセント光応用超解像計測，精密工学会関西支部 生産技術特別セミナー－材料，加工，計測，システム各分野の最新技術動向－，2007.12.4
  46. 高橋哲【解説論文】：近接場光を利用した界面・表面層評価技術（特集: 表面特性評価のためのユニーク計測技術），精密工学会誌，73,8(2007)883-887
  47. 高橋哲，奥野将樹，高増潔【解説論文】：光触媒ナノ粒子を用いたマイクロ三次元金属構造の創製－三次元ビームスキャンによるマクロ立体構造の直接描画－, 光アライアンス, 18(5), 200(2007)28-31, 52
  48. 高橋哲【招待講演】：近接場光を用いた半導体ウエハ表面性状の高分解能評価，精密工学会 2007年度秋季大会シンポジウム－最先端の光計測－，2007.9.12
  49. K. Takamasu, S. Takahashi, M. Abbe, R. Furutani【招待講演】：Uncertainty Estimation for Coordinate Metrology: Calibration, Form Deviation and Strategy of Measurement，(ISMTII2007)1-4
  50. S. Takahashi, S. Okada, H. Nishioka, S. Usuki, K. Takamasu【招待講演】：Analysis of Lateral Resolution Improvement for Fluorescence Microscopy using Standing Evanescent Light，(ISMTII2007)45-48
  51. Y. Kajihara, T. Takeuchi, S. Takahashi, K. Takamasu【招待講演】：An Optical and Confocal Microscopic System for Nanostereolithography Using Evanescent Light，(ISMTII2007)79-82
  52. S. Usuki, H. Nishioka, S. Takahashi, K. Takamasu【招待講演】：Experimental Verification for Super-resolution Optical Inspection for Semiconductor Defect by using Standing Wave Illumination Shift，(ISMTII2007)387-390
  53. 高橋哲，高増潔【解説論文】：ナノ・マイクロファブリケーションにおける機能表面の先端光計測技術（特集:特集 I ナノテクノロジー），トライボロジー, 21, 2, 234(2007)19-21
  54. 高橋哲【招待講演】：局在光エネルギーによるナノ加工・ナノ計測，にいがたナノテク研究会 第7回ナノ加工・計測分科会2007.6.29
  55. 高橋哲（分担執筆）：「9. 近接場を利用した検査技術」項，平成18年度先端的外観検査技術に関する調査研究報告書, 日本機械工業連合会，日本オプトメカトロニクス協会(2007)175-184
  56. 高橋哲（分担執筆）：「16.8 加工計測（加工学・加工機器）」項，（特集:創立110周年記念機械工学年鑑）日本機械学会誌, 8, 110(2007)61-62
  57. 高橋哲（分担執筆）：「11. 光を用いた計測手法（寸法・形状・粗さを測る）」項，図解 砥粒加工技術のすべて（砥粒加工学会編）, 工業調査会(2006)206-207
  58. 高橋哲，三好隆志【解説論文】：ナノ・マイクロファブリケーションにおける高分解能光計測技術 エバネッセント光を利用したナノ計測技術とその可能性，検査技術, 11, 3, 113 (2006)1-7
  59. 高橋哲，高増潔，三好隆志【解説論文】：エバネッセント光を利用した微細加工と高分解能計測 (特集:ナノ材料にみる近接場光学の新展開)，光アライアンス, 17( 6), 189(2006)1-5,63
  60. 高橋哲（分担執筆）：「3.2. 半導体微細加工分野におけるFunctional Inspection」項，平成17年度新製造技術に関する調査研究報告書―製造技術の情報化促進―，日本機械工業連合会，製造科学技術センター(2006)32-42
  61. 高橋哲，三好隆志【解説論文】：ナノ・マイクロファブリケーションにおける光学的計測技術のアプローチ（小特集:ナノ・マイクロテクノロジーの視点から見た材料加工技術の最前線），日本機械学会誌, 108, 1040(2005)537-539
  62. 高橋哲【招待講演】：エバネッセント光局在エネルギーを利用したナノ光造形法とその可能性，プラスチック成形加工学会 第87回講演会－ここまで来た，マイクロ・ナノの成形加工－，2005.10.26
  63. 高橋哲【招待講演】：エバネッセント光を利用したナノ光造形法の実現に向けて，光産業技術振興協会 平成17年度第2回多元技術融合光プロセス研究会－次世代産業に期待されるレーザプロセス：ナノ構造の創製－，2005.9.26
  64. 高橋哲【招待講演】：エバネッセント光を利用した微細加工および高分解能計測，精密工学会 2005年度秋季大会シンポジウム－次世代生産システムを先導する萌芽研究－，2005.9.15
  65. 高橋哲【招待講演】：エバネッセント光を用いた微小構造造形，レーザ加工学会 第63回レーザ加工学会－3次元加工－，2005.5.25
  66. 高橋哲，梶原優介，高増潔【解説論文】：ナノ光造形法への新しいレーザー応用技術（特集:レーザー応用技術で進化する成形加工），成形加工, 17, 3(2005)161-166
  67. 高橋哲【招待講演】：エバネッセント光を利用したナノ光造形法に関する基礎的研究，RP産業協会 第27回ラピッドプロトタイピングシンポジウム，2004.11.18
  68. 高橋哲【招待講演】：エバネッセント光を使用した光表面欠陥検査技術，精密工学会 プラナリゼーションCMPとその応用技術専門委員会 第58回研究会－CMP関連の注目される検査技術－，2004.7.2
  69. S. Takahashi, R. Nakajima, T. Miyoshi, Y. Takaya, T. Yoshioka, T. Hariyama, K. Kimura, T. Nakao, K. Takamasu【招待講演】：Nano-Defects Inspection of Semiconductor Wafer using Evanescent Wave，VDI Berichte, 1844,307-316.
  70. 高橋哲【招待講演】：近接場光学を利用したSiウエハ加工表面のナノ欠陥計測（特集:極限の光計測），画像応用技術専門委員会報告, 精密工学会, 17, 5(2003)1-10，2003.3.14